2019
DOI: 10.1016/j.matpr.2019.07.621
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Growth and electrochemical properties of RF sputter deposited Li[Ni0.5Co0.25Mn0.25]O2 film cathodes

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Cited by 1 publication
(2 citation statements)
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“…NMC thin films were mainly deposited via PLD and RF sputtering [392][393][394][395][396]. Prathibha et al [394] grew polycrystalline Li(Ni 0.5 Co 0.25 Mn 0.25 )O 2 thin films with mainly (001) and ( 104) orientations on Au-coated Si substrates via RF sputtering, obtaining a good discharge capacity of 57.5 µAh/cm 2 µm.…”
Section: Cathodesmentioning
confidence: 99%
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“…NMC thin films were mainly deposited via PLD and RF sputtering [392][393][394][395][396]. Prathibha et al [394] grew polycrystalline Li(Ni 0.5 Co 0.25 Mn 0.25 )O 2 thin films with mainly (001) and ( 104) orientations on Au-coated Si substrates via RF sputtering, obtaining a good discharge capacity of 57.5 µAh/cm 2 µm.…”
Section: Cathodesmentioning
confidence: 99%
“…NMC thin films were mainly deposited via PLD and RF sputtering [392][393][394][395][396]. Prathibha et al [394] grew polycrystalline Li(Ni 0.5 Co 0.25 Mn 0.25 )O 2 thin films with mainly (001) and ( 104) orientations on Au-coated Si substrates via RF sputtering, obtaining a good discharge capacity of 57.5 µAh/cm 2 µm. Tan et al [392] reported the orientation control of NMC sputtered thin films with different post-annealing temperatures ranging from 400 • C to 700 • C. In this work, the dominant orientation of the films changed from ( 104) to a mixture of ( 110) and (104).…”
Section: Cathodesmentioning
confidence: 99%