Growth and characterization of yttrium oxide films by reactive magnetron sputtering

Zhu, Jiaqi; Zhu, Yuankun; Shen, Weixia; Wang, Yongjie; Han, Jiecai; Tian, Gui Yun; Lei, Pei; Dai, Bing

doi:10.1016/j.tsf.2011.01.049

Cited by 50 publications

(22 citation statements)

References 27 publications

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“…The Eu 3+ doped Y 2 O 3 is a well-known red phosphor [25]. The Y 2 O 3 thin films have been deposited by several deposition techniques: radio frequency (RF) magnetron sputtering, pulsed laser ablation, ion-beam sputtering, solvothermal process, hydrothermal reaction, wet-chemical method, physical vapor deposition (PVD) methods and reactive sputtering [26,30,31,32,33,34,35,36]. Yttrium oxide through synthesis has enabled the creation of structures such as nanoparticles, nanotubes, nanorods, nanospheres, nanoflowers, etc .…”

Section: Introductionmentioning

confidence: 99%

Wettability of Y2O3: A Relative Analysis of Thermally Oxidized, Reactively Sputtered and Template Assisted Nanostructured Coatings

et al. 2012

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The wettability of reactively sputtered Y2O3, thermally oxidized Y-Y2O3 and Cd-CdO template assisted Y2O3 coatings has been studied. The wettability of as-deposited Y2O3 coatings was determined by contact angle measurements. The water contact angles for reactively sputtered, thermally oxidized and template assisted Y2O3 nanostructured coatings were 99°, 117° and 155°, respectively. The average surface roughness values of reactively sputtered, thermally oxidized and template assisted Y2O3 coatings were determined by using atomic force microscopy and the corresponding values were 3, 11 and 180 nm, respectively. The low contact angle of the sputter deposited Y2O3 and thermally oxidized Y-Y2O3 coatings is attributed to a densely packed nano-grain like microstructure without any void space, leading to low surface roughness. A water droplet on such surfaces is mostly in contact with a solid surface relative to a void space, leading to a hydrophobic surface (low contact angle). Surface roughness is a crucial factor for the fabrication of a superhydrophobic surface. For Y2O3 coatings, the surface roughness was improved by depositing a thin film of Y2O3 on the Cd-CdO template (average roughness = 178 nm), which resulted in a contact angle greater than 150°. The work of adhesion of water was very high for the reactively sputtered Y2O3 (54 mJ/m2) and thermally oxidized Y-Y2O3 coatings (43 mJ/m2) compared to the Cd-CdO template assisted Y2O3 coating (7 mJ/m2).

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Section: Introductionmentioning

confidence: 99%

Wettability of Y2O3: A Relative Analysis of Thermally Oxidized, Reactively Sputtered and Template Assisted Nanostructured Coatings

et al. 2012

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“…In case of films E and F there is a loss of crystalline nature of the films as is evident from the diffraction patterns that show two broad peaks centered at 2Â = 29 • and 56 • . The orientation of the films depends on the deposition method, temperature of the substrate, oxygen partial pressure and the total gas pressure during the deposition [22]. The interfacial reactions and the thickness of the interface also play a prominent role in deciding about the orientation as reported earlier by Cho et al [30].…”

Section: Discussionmentioning

confidence: 77%

“…The Y 3d core level is getting splitted into doublet (Y 3d 5/2 and Y 3d 3/2 ) due to spin orbit coupling. The doublet has energy separation of 2.1 eV and Y 3d 5/2 to Y 3d 3/2 areal intensity ratio is 1.5 [22]. The Y 3d peak is deconvoluted with Gaussian:Lorentzian (G:L) ratio of 5 with FWHM of individual peaks in the range of 1-1.8 eV and chi-square ( 2 ) in the range of 1-2.…”

Section: X-ray Photoelectron Spectroscopymentioning

confidence: 99%

RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition

Chopade

Barve

Raman

et al. 2013

Applied Surface Science

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a b s t r a c tYttrium oxide (Y 2 O 3 ) thin films have been deposited by radio frequency plasma assisted metal organic chemical vapor deposition (MOCVD) process using (2,2,6,6-tetramethyl-3,5-heptanedionate) yttrium (commonly known as Y(thd) 3 ) precursor in a plasma of argon and oxygen gases at a substrate temperature of 350 • C. The films have been deposited under influence of varying RF self-bias (−50 V to −175 V) on silicon, quartz, stainless steel and tantalum substrates. The deposited coatings are characterized by glancing angle X-ray diffraction (GIXRD), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry and scanning electron microscopy (SEM). GIXRD and FTIR results indicate deposition of Y 2 O 3 (BCC structure) in all cases. However, XPS results indicate nonstoichiometric cubic phase deposition on the surface of deposited films. The degree of nonstoichiometry varies with bias during deposition. Ellipsometry results indicate that the refractive index for the deposited films is varying from 1.70 to 1.83 that is typical for Y 2 O 3 . All films are transparent in the investigated wavelength range 300-1200 nm. SEM results indicate that the microstructure of the films is changing with applied bias. Results indicate that it is possible to deposit single phase cubic Y 2 O 3 thin films at low substrate temperature by RF plasma MOCVD process. RF self-bias that decides about the energy of impinging ions on the substrates plays an important role in controlling the texture of deposited Y 2 O 3 films on the substrates. Results indicate that to control the structure of films and its texture, it is important to control the bias on the substrate during deposition. The films deposited at high bias level show degradation in the crystallinity and reduction of thickness.

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“…4(a), the splitted spectrums is composed by two peaks locating at 156.7 and 158.8 eV bonding energy, which are corresponding to the standard peak position of Y3d 5/2 and Y3d 3/2 [12,13] and in Fig. 4(b), the splitted spectrums is locating at 528.8 eV and 531.5 eV bonding energy, which are corresponding to the standard peak position of O1s 3/2 and O1s 1/2 [12] related to Y-O bonding in Y 2 O 3 film. The O1s and Y3d peaks are well fitted by two Gaussian curves, respectively.…”

Section: Methodsmentioning

confidence: 99%

“…Recently, in order to solve these two challenges, coating a protective and antireflective film on ZnS was commonly adopted by researchers; several materials were commonly chosen as protective and antireflective systems such as oxide [9], fluoride [10] and phosphide [11]. Among oxide, Y 2 O 3 and SiO 2 have attracted much attention from science community as their well environmental durability and high infrared transmittance [12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Enhancement in hardness and transmittance of ZnS via SiO2/Y2O3 multilayer

Zhang¹,

Jin²,

Song³

et al. 2012

Journal of Alloys and Compounds

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Growth and characterization of yttrium oxide films by reactive magnetron sputtering

Cited by 50 publications

References 27 publications

Wettability of Y2O3: A Relative Analysis of Thermally Oxidized, Reactively Sputtered and Template Assisted Nanostructured Coatings

Wettability of Y2O3: A Relative Analysis of Thermally Oxidized, Reactively Sputtered and Template Assisted Nanostructured Coatings

RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition

Enhancement in hardness and transmittance of ZnS via SiO2/Y2O3 multilayer

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