2021
DOI: 10.1016/j.nme.2021.101091
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Growth and characterization of W thin films with controlled Ne and Ar contents deposited by bipolar HiPIMS

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Cited by 8 publications
(8 citation statements)
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“…As can be seen, for short negative pulses, during the reverse pulse, the plasma potential is almost constant and reach values close to the target voltage. It should be noted that the plasma potential during the positive pulse is quasi-uniformly distributed along the target-to-substrate distance, a similar observation being recently reported elsewhere [17,32]. This means that during deposition onto grounded substrate, the plasma ions are accelerated only in the substrate sheath potential.…”
Section: Films Characterizationsupporting
confidence: 80%
See 1 more Smart Citation
“…As can be seen, for short negative pulses, during the reverse pulse, the plasma potential is almost constant and reach values close to the target voltage. It should be noted that the plasma potential during the positive pulse is quasi-uniformly distributed along the target-to-substrate distance, a similar observation being recently reported elsewhere [17,32]. This means that during deposition onto grounded substrate, the plasma ions are accelerated only in the substrate sheath potential.…”
Section: Films Characterizationsupporting
confidence: 80%
“…The temporal evolution and the axial distribution of the plasma and floating potential were monitored using an emissive/cold probe. More details on the emissive probe measurements can be found elsewhere [32]. Figure 1 shows the schematic diagram of the experimental set-up used in this work.…”
Section: Films Depositionmentioning
confidence: 99%
“…In both operation modes, the space-and-time evolution of the plasma potential has been recorded using an emissive probe system working in the so-called "saturated floating-potential regime" [52]. A detailed description of plasmapotential-measurement technique was reported in one of our previous works [53]. In this work, plasma-potential measurements have been performed along the TVA discharge axis, between Wehnelt cylinder and top side of the chamber wall (35 cm above the anode), using a step size of 5 mm.…”
Section: Plasma Diagnosismentioning
confidence: 99%
“…In Table 1, it can be seen for W 66 that Be plasma parameters (I, V) are significantly lower, which in turn leads to a reduced plasma density, a lower ionization yield and consequently to a reduction of the ion flux impinging on the just forming layers. On the other hand, the W50 sample has the highest power applied to both Be and W cathodes, leading to an enhanced ion bombardment during deposition and consequently to an increased ad-atom mobility which improves the crystalline structure [42]. The analysis of the diffraction peak profiles was performed in order to assess the crystalline size from the peak full width at half maximum.…”
Section: Crystalline Structurementioning
confidence: 99%