Growth and characterization of spray pyrolysis deposited copper oxide thin films: Influence of substrate and annealing temperatures

Saravanan, Vignesh; Shankar, P.; Mani, Ganesh Kumar; Rayappan, John Bosco Balaguru

doi:10.1016/j.jaap.2014.08.008

Cited by 67 publications

(23 citation statements)

References 22 publications

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“…6, and the estimated values of the band gap have been listed in Table 5. The resulting band gap values are in good agreement with the literature 13,28 . It seems that, among the factors which can possibly alter the band gap, the crystallite size of the CuO films are mainly responsible for the variation of the bandgap in this study.…”

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confidence: 90%

“…Among the spray deposition parameters, the substrate temperature and annealing temperature are the most common parameters optimized to obtain a thin film with desirable features. In the last decade, there has been several studies in which the influence of aforementioned factors has been investigated 13,14 ; yet in this study, CuO thin films have been deposited in high substrate temperatures starting from 450ºC and finishing at 550ºC in which the deposition rate declines drastically. It was found that, up to 525ºC, as the substrate temperature increases, the resistivity of the resulting CuO thin films decreases and again it increases for the film deposited at 550ºC.…”

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confidence: 99%

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Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process

Asl

Rozati

2018

Mat. Res.

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In this study, CuO thin films were deposited on glass substrates at a wide range of temperatures from 450ºC to 550ºC with steps of 25ºC by chemical spray pyrolysis technique. Aiming to investigate the effect of annealing process, one of the resulting films was annealed at 450ºC for 3 hours under ambient air. Based on X-ray diffraction, all the resulting films are monoclinic with two prominent peaks at ~36º and ~39º. The crystallite size of the CuO film deposited at 450ºC was found to be the largest in comparison with the others. As the substrate temperature increased, a gradual change was observed for the CuO thin film surface morphology and in the case of annealed film, the grains and their boundaries became indistinguishable. The resistivity of the films was reduced by virtue of increasing the substrate temperature and also, both the mobility and carrier concentration of the annealed film were improved drastically after annealing. As expected, the CuO thin films absorption was considerable in the visible region and gradually declined after 800nm. The estimated band gap value of the CuO film deposited at 450ºC were fairly close to the optimum band gap for solar applications.

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confidence: 90%

mentioning

confidence: 99%

Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process

Asl

Rozati

2018

Mat. Res.

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“…It has been reported that growth of cuprous oxide results in formation of two phases, copper(I) oxide Cu 2 O and copper(II) oxide CuO, cupric oxide. [1][2][3][4][5] Current applications of copper oxide include use in solar cells and electro-chromic devices. 6 As industrial catalysts, copper oxide nanoparticles may take the place of metal catalysts for oxidation and reduction of carbon monoxide, 7 which minimizes manufacturing costs and enhances catalytic efficiency.…”

Section: Introductionmentioning

confidence: 99%

Characterization of Copper Oxide Nanoparticles Fabricated by the Sol–Gel Method

Kayani

Umer

Riaz

et al. 2015

Journal of Elec Materi

137

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Copper oxide nanoparticles were successfully prepared by a sol-gel technique. An aqueous solution of copper nitrate Cu(NO 3 ) 2 and acetic acid was used as precursor. On addition of sodium hydroxide (NaOH) a precipitate of copper oxide was immediately formed. The copper oxide nanoparticles were characterized by use of x-ray diffractometry (XRD), thermogravimetric analysis (TGA), differential thermal analysis, differential scanning calorimetry, Fourier-transform infrared spectroscopy (FTIR), vibrating sample magnetometry, and scanning electron microscopy (SEM). The XRD pattern contained sharp peaks of copper oxide nanoparticles with mixed cuprite and tenorite phases. Use of the Debye-Scherer equation showed that the crystallite size of the copper oxide nanoparticles increased with increasing annealing temperature. FTIR spectra revealed vibration of the CuO band at 473 cm À1 ; a band at 624 cm À1 was attributed to Cu 2 O. Maximum coercivity and saturation magnetization of the nanoparticles were 276 Oe and 0.034 emu/g, respectively. SEM micrographs of the nanoparticles revealed the presence of spherical nanoparticles of the tenorite phase whereas the cuprite phase was in the form of a compact deposit.

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“…Especially, Cu x O thin films are potential for photovoltaic applications, due to their good properties such as high absorption coefficient in the visible region, elemental abundance, non-toxicity and stability with the characteristicofbeing"ultra-low-cost".Their direct optical band gap energy is in the range of (2.1 to 2.6 eV) for Cu 2 O and (1.21 to 2.1 eV) for CuO [18][19][20][21][22]. Copper oxide thin films had been fabricated by various techniques such as electrodeposition [23], pulsed laser deposition [24], sol-gel technique [21], spay pyrolysis [25] …etc. However, the common technique used is thermal evaporation due to its simplicity, low cost, reproducibility, ease of composition control and large area deposition.…”

Section: Introductionmentioning

confidence: 99%

Effect of angle deposition γ on the structural, optical and electrical properties of copper oxide zigzag (+γ, −γ) nanostructures elaborated by glancing angle deposition

et al. 2018

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In this work, Cu x O thin films were obtained by air annealing of copper thin films deposited on glass substrates using thermal evaporation method by Glancing Angle Deposition "GLAD" technique. The copper was sculptured into a zigzag shape, which presents two columns with inclined angles + and-where is the deposition angle between the incident flux and the substrate normal. Morphological, structural, optical and electrical properties of the obtained thin films were investigated using X-ray diffraction (XRD), UV-Vis-NIR Spectroscopy and electrical resistivity measurements. The XRD patterns revealed that thin films deposited at different incident angles are mainly crystallized in Cu 2 O cubic phase characterized by the preferential orientation along (111) plane. The optical parameters were calculated from the analysis of the transmittance and reflectance spectra in the wavelength range 300-1800 nm. Theabsorptioncoefficient exceeds 10 5 cm-1 in the visible and NIR spectral ranges. Direct band gap energy increases from 2 to 2.54 eV with deposition angle. The in-plane birefringence and the anisotropic resistivity of the Cu 2 O films were also studied. Their maxima were obtained at incident flux angle of = 60°. Therefore, the GLAD technique is a promising way to create zigzag nanostructures with enhanced anisotropic properties.

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Growth and characterization of spray pyrolysis deposited copper oxide thin films: Influence of substrate and annealing temperatures

Cited by 67 publications

References 22 publications

Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process

Spray Deposited Nanostructured CuO Thin Films: Influence of Substrate Temperature and Annealing Process

Characterization of Copper Oxide Nanoparticles Fabricated by the Sol–Gel Method

Effect of angle deposition γ on the structural, optical and electrical properties of copper oxide zigzag (+γ, −γ) nanostructures elaborated by glancing angle deposition

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