Growth and characterization of chromium oxide coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering

Barshilia, Harish C.; Rajam, K.S.

doi:10.1016/j.apsusc.2008.08.057

Cited by 70 publications

(50 citation statements)

References 39 publications

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“…These very low hardness values observed may be attributed to the formation of amorphous Cr 2 O 3 instead of crystalline Cr 2 O 3 . Amorphous structures, being more open and thus having a lower bond density, normally produce lower hardness values than their crystalline counterparts [20]. The presence of a Cr-rich region in the films in series B and C did not seem to have a strong effect on the hardness values as can be seen from the similar values for series A and B.…”

Section: Nanoindentation Experiments: Hardnessmentioning

confidence: 80%

“…2 includes the diffractograms for series C, which display the typical features observed in all the films. The patterns basically show peaks from the HK40 steel and a bump around 2Â = 22 • which has been associated to amorphous Cr 2 O 3 [20]. No peaks from crystalline Cr 2 O 3 were observed.…”

Section: Effect Of Deposition Time and Mode Of Oxygen Feeding: Seriesmentioning

confidence: 95%

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Structural and mechanical analysis for the optimization of PVD oxide coatings for protection against metal dusting

López

Salas

Melo-Máximo

et al. 2012

Applied Surface Science

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Section: Nanoindentation Experiments: Hardnessmentioning

confidence: 80%

Section: Effect Of Deposition Time and Mode Of Oxygen Feeding: Seriesmentioning

confidence: 95%

Structural and mechanical analysis for the optimization of PVD oxide coatings for protection against metal dusting

López

Salas

Melo-Máximo

et al. 2012

Applied Surface Science

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“…α-Cr2O3 being the only crystal structure at this oxygen content for Cr makes it easier to obtain this structure with PVD-techniques. It has been deposited at temperatures of ~480 °C [42] with cathodic arc technique, and with different kind of sputtering techniques from ~60 °C [43] and ~300°C (higher crystallinity) [44,45]. This makes it suitable for stabilizing other compounds in the corundum structure.…”

Section: α-Cr2o3mentioning

confidence: 99%

Thin Film and Plasma Characterization of PVD Oxides

Landälv¹

2017

Linköping Studies in Science and Technology. Dissertations

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The state-of-the-art tools for machining metals are primarily based on a metal-ceramic composite (WC-Co) coated with different combinations of carbide, nitride and oxide coatings. Combinations of these coating materials are optimized to withstand specific wear conditions. Oxide coatings are especially desired because of their possible high hot hardness, chemical inertness with respect to the workpiece, and their low friction.This thesis deals with process and coating characterization of new oxide coatings deposited by physical vapor deposition (PVD) techniques, focusing on the Cr-Zr-O and Al-Cr-Si-O systems.The thermal stability of α-Cr0.28Zr0.10O0.61 deposited by reactive radio frequency (RF)-magnetron sputtering at 500 °C was investigated after annealing up to 870 °C. The annealed samples showed transformation of α-(Cr,Zr)2O3 and amorphous ZrOx-rich areas into tetragonal ZrO2 and bcc Cr. The instability of the α-(Cr,Zr)2O3 is surprising and possibly related to the annealing being done under vacuum, facilitating the loss of oxygen. The stabilization of the room temperature metastable tetragonal ZrO2 phase, due to surface energy effects, may prove to be useful for metal cutting applications. The observed phase segregation of α-(Cr,Zr)2O3 and formation of tetragonal ZrO2 with corresponding increase in hardness for this pseudo-binary oxide system also opens up design routes for pseudo-binary oxides with tunable microstructural and mechanical properties.The inherent difficulties of depositing insulating oxide films with PVD, demanding a closed circuit, makes the investigation of process stability an important part of this research. In this context, we investigated the influence of adding small amount of Si in Al-Cr cathode on plasma characteristics, process parameters, and coating properties. Si was chosen here due to a previous study showing improved erosion behavior of Al-Cr-Si over pure Al-Cr cathode without Si incorporation in the coating.This work shows small improvements in cathode erosion and process stability (lower pressure and cathode voltage) when introducing 5 at % Si in the Al70Cr30-cathode. This also led to fewer droplets at low cathode current and intermediate O2 flow. A larger positive effect on cathode erosion was observed with respect to cleaning the cathode from oxide contamination by increasing cathode current with 50%. However, higher cathode current also resulted in increased amount of droplets in the coating which is undesirable. Through plasma analysis the presence of volatile SiO species could be confirmed but the loss of Si through volatile SiO species was negligible, since the coating composition matched the cathode composition. The positive effect of added Si on the process stability at the cathode surface should be weighed against Si incorporation in the coating. This incorporation may or may not be beneficial for the final application since literature states that Si promotes the metastable γ-phase over the thermodynamically stable α-phase of pure Al2O3, contrary to the effect o...

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“…Among them, magnetron sputtering [4] is one of the most popular methods which produces films with uniform composition and good adhesion to the substrates [3] . Also, the medium-frequency (MF) unbalanced magnetron sputtering has been developed for deposition of nitrides and oxides, such as AlN and TiO 2 [5,6] .…”

Section: Introductionmentioning

confidence: 99%

“…There are various forms of chromium oxide phases, among which Cr 2 O 3 is the most stable phase under normal conditions [3] .…”

Section: Introductionmentioning

confidence: 99%

Influence of target-substrate distance and sputtering power on chromium oxide films prepared by medium-frequency magnetron sputtering

Yang

Tian

et al. 2010

Wuhan Univ. J. Nat. Sci.

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Chromium oxide films were deposited on Si (100) substrates by medium-frequency (MF) unbalanced magnetron sputtering at different target-substrate distances D TS (60, 100, 120 mm) and sputtering power (2.8, 5.6, 11.2 kW), respectively. The structure, surface morphologies, and microhardness of the chromium oxide films were examined by X-ray diffraction (XRD), atomic force microscopy (AFM), and microhardness tester. The results indicate that elevated MF sputtering power can improve the crystallization of the films; The D TS value affects the structure of the films by changing the preferential orientation from CrO 3 (221) to Cr 2 O 3 (116); The microhardness of the chromium oxide films is found to increase with the sputtering power. For preparing the Cr 2 O 3 -dominated films with comparatively high-performance, the optimized condition is the target-substrate distance of 100 mm and MF sputtering power of 11.2 kW.

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Growth and characterization of chromium oxide coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering

Cited by 70 publications

References 39 publications

Structural and mechanical analysis for the optimization of PVD oxide coatings for protection against metal dusting

Structural and mechanical analysis for the optimization of PVD oxide coatings for protection against metal dusting

Thin Film and Plasma Characterization of PVD Oxides

Influence of target-substrate distance and sputtering power on chromium oxide films prepared by medium-frequency magnetron sputtering

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