Grid polarizer for the visible spectral region

Stenkamp, B.; Abraham, Michaël; Ehrfeld, W.; Knapek, E.; Hintermaier, M.; Gale, M. D.; Morf, R.

doi:10.1117/12.180973

Cited by 20 publications

(8 citation statements)

References 1 publication

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“…For this purpose we used metallic subwavelength gratings. Polarization effects on such gratings were calculated and shown by Stenkamp et al [2] before. They used a 100 nm period grating etched in a 100 nm thick tungsten layer.…”

Section: Polarizing Elementsmentioning

confidence: 99%

<title>Application of metallic subwavelength gratings for polarization devices</title>

et al. 1996

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E-beam lithography offers the possibility for fabricating metallic subwavelength gratings for visible light which show strong polarization properties. By using such gratings and other microoptical elements (like lenses and diffraction gratings) a new kind of polarization detector without mechanical motion is proposed. The basic idea is the use of a special analyzing grating element with different grating directions (e.g. a circular metallic subwavelength grating). We realized both a wavelengthindependent polanmeter and a polarimeter with spectroscopic properties. Characteristic parameters estimated are the angular resolution of the polarization plane (best value 0.001°) and the wavelength resolution (best value 1 5 rim).

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Section: Polarizing Elementsmentioning

confidence: 99%

<title>Application of metallic subwavelength gratings for polarization devices</title>

et al. 1996

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“…In the 1960s, WGPs operating in the infrared region were fabricated [1][2][3]. Since the 1990s, WGPs for the visible region have been fabricated with nanostructures using electron beam lithography (EBL) [4][5][6][7][8][9]. Wang and coworkers fabricated WGPs by using narrow strips less than 100 nm that could be used over a large range of wavelengths, such as the deep UV to near infrared light [9].…”

Section: Introductionmentioning

confidence: 99%

Extraordinary Optical Transmission Exhibited by Surface Plasmon Polaritons in a Double-Layer Wire Grid Polarizer

et al. 2015

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We fabricate a double-layer wire grid polarizer (WGP) and perform optical characterization to clarify the relationship between the structural and polarization characteristics. For normal incidence, the fabricated double-layer WGP exhibits an extinction ratio of 30.4 dB for a period of 400 nm. The transverse magnetic transmittance peak angle is found to vary with the period of the WGP. The peak shift can be explained on the basis of the extraordinary optical transmittance phenomena exhibited by the surface plasmon polaritons (SPPs) of metal slit structures according to the dispersion curve of the SPP. From the simulation of rigorous coupledwave analysis, it is considered that the incident light passes through the resist layer, followed by the excitation of SPPs at the interface between the resist and Au. Subsequently, the SPPs combine with the transmitted light in the glass substrate, leading to strong transmitted light with transverse magnetic polarization. Therefore, we demonstrate the extraordinary optical transmittance phenomena exhibited by the SPPs by both experiment and simulation.

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“…Integration capability with other optical components is another issue due to their special fabrication process. To make high quality, commercially viable, integration capable thin-film type polarizers, in the past few decades, researchers have kept thinking of new ideas and corresponding fabrication processes [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Metal wire-grid [2][3][4][5][6][7][8][9][10][11][12][13][14][15] is one potential candidate for making high quality integration capable thin-film type polarizer (and/or polarizing beam splitter).…”

Section: Introductionmentioning

confidence: 99%

“…In the past many decades, constant efforts [2][3][4][5][6][7][8][9][10][11][12][13][14] have been made trying to make commercially viable high quality wire-grid polarizers. It was realized that lithography is needed to make good quality wire-grid polarizers.…”

Section: Introductionmentioning

confidence: 99%

High-performance large-area ultra-broadband (UV to IR) nanowire-grid polarizers and polarizing beam-splitters

et al. 2005

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Aluminum nanowire-grid polarizers and polarizing beam splitters with a fixed pitch (i.e., period) of ~146 nm but a wide range of linewidths (from < 60 nm to 90 nm) and heights (from 150 nm to 200 nm) are studied. Immersion interference lithography, UV-nanoimprint lithography and aluminum reactive ion etching were used to fabricate the nanowire-grid polarizers. Optical performance of the nanowire-grid polarizers was characterized in a broad spectral range from UV (< 400 nm) to near infrared (> 1700 nm). The performance trade-off between transmittance/reflectance and extinction ratio is investigated in details. The developed highperformance large-area broadband nanowire-grid polarizer opens the potential for many optical applications particularly integrated optics.

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Grid polarizer for the visible spectral region

Cited by 20 publications

References 1 publication

<title>Application of metallic subwavelength gratings for polarization devices</title>

<title>Application of metallic subwavelength gratings for polarization devices</title>

Extraordinary Optical Transmission Exhibited by Surface Plasmon Polaritons in a Double-Layer Wire Grid Polarizer

High-performance large-area ultra-broadband (UV to IR) nanowire-grid polarizers and polarizing beam-splitters

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