2012 Conference on Precision Electromagnetic Measurements 2012
DOI: 10.1109/cpem.2012.6251072
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Graphene Epitaxial growth on SiC(0001) for resistance standards

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Cited by 8 publications
(15 citation statements)
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“…If p  = 2 [10,25], then the exponent in the temperature-scaling relation is 0.5 [21,26-28] which is consistent with our experimental results obtained on Dirac fermions. We note that our experimental results are equivalent to a T 4 dependence of energy loss rate for Dirac fermions as calculated [29] and observed in epitaxial, CVD-grown and exfoliated graphene [10,30].…”
Section: Resultssupporting
confidence: 89%
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“…If p  = 2 [10,25], then the exponent in the temperature-scaling relation is 0.5 [21,26-28] which is consistent with our experimental results obtained on Dirac fermions. We note that our experimental results are equivalent to a T 4 dependence of energy loss rate for Dirac fermions as calculated [29] and observed in epitaxial, CVD-grown and exfoliated graphene [10,30].…”
Section: Resultssupporting
confidence: 89%
“…First, the SiC substrate was cleaned using a standard procedure for substrate cleaning [21]. Second, the optically polished Si-face surface was placed face-to-face with a polished graphite disk (FTG) and arranged such that uniform Newton rings were observed in fluorescent light [21]. The optically finished substrate surfaces resulted in a higher rate of SiC decomposition compared to chemical–mechanical processed (CMP) surfaces and created multiple graphene layers.…”
Section: Methodsmentioning
confidence: 99%
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“…The quantum Hall effect (QHE) [3, 7], a phenomenon which is observed under Landau quantization, has been widely studied in graphene [2, 3, 7]. Characterization of electronic transport, for example in the research of graphene-based quantum Hall (QH) resistance standards [8, 9, 10], requires measurements of the carrier density since it plays a crucial role in determining the magnetic field dependence of device transport properties. Therefore, it is necessary to find a reliable method to determine the carrier density in particular at different temperatures.…”
Section: Introductionmentioning
confidence: 99%
“…at higher temperatures [13] where carbon can readily diffuse on the SiC surface. As in [14]- [16], we control the Si sublimation/ diffusion rate during annealing at very high temperature by using Ar background gas and by physical confinement, both of which lower the sublimation rate. The Si-rich decomposition products are confined in our laboratory by creating a narrow gap region through which the vapor must diffuse [17], [18].…”
Section: Epitaxial Growth Processmentioning
confidence: 99%