Grain Size Dependent Transport and Magnetoresistance Behavior of Chemical Solution Deposition Grown Nanostructured La₀₇Sr₀₃MnO₃ Manganite Films

Abstract

Grain-size dependence of electronic transport and magnetoresistance (MR) properties of nanostructured La0.7Sr0.3MnO3 (LSMO) manganite thin films on LaAlO3 (100) single crystal substrates prepared using Chemical Solution Deposition (CSD) technique have been studied. The LSMO thin films were annealed at temperatures in the range of 700-1000 degrees C for different time intervals [6 h and 12 h] and crystallized as singlephase LSMO. Microstructural studies carried out using AFM show a marginal increase in the grain-size from 50 to 90 nm as the temperature was varied from 700 degrees C to 1000 degrees C respectively. It has been observed that the insulator-metal transition (T(p)) and MR depend on the grain size. In zero applied field, resistivity reduction is approximately 10(3) at 5 K for the films annealed at 700 degrees C [T(p) approximately 341 K] and 1000 degrees C [T(p) approximately 373 K]. MR versus H isotherms reveal that MR enhances in the vicinity of T(p) but decreases at low temperatures. The results obtained from the electronic and magnetotransport studies are in good agreement with the change in surface morphology of the films studied, which shows that the randomly distributed domains are composed of faceted grains. Synthesizing conditions, annealing temperature and time control the growth and alignment of grains into the domains, which cause better conduction at grain interface.

Structure and microstructure dependent transport and magnetic properties of sol–gel grown nanostructured La 0.6 Nd 0.1 Sr 0.3 MnO 3 manganites: Role of oxygen

“…A c c e p t e d M a n u s c r i p t 15 Upon annealing process (from S7 to A7), strained boundary issues are responsible for the decrease in magnetization throughout the temperature range studied (with the decrease in T F ). Figure 14 shows the M -T plots with field cooled cooling (FCC) and field cooled warming (FCW) magnetization measurements under 1KOe and 100KOe fields for S7, S8 and S9 nanostructured LNSMO samples.…”

“…Manganites have been studied in various forms such as polycrystalline bulk [4,6,7], nanostructures [16 -18], thin films [11 -13, 15], multilayers [3], heterostructures [5,8,9] and devices [14,19] for their transport and magnetotransport properties useful in various suitable practical applications such as bolometric applications, field and temperature sensors, p-n junctions, field form of bulk, thin films and nanostructures [15,17,20]. Also, rare earth ion substituted at La-site in La 0.7 Sr 0.3 MnO 3 (in the form of thin films, multilayers, heterostructures and nanostructured devices) has been studied in the form of nanostructured thin film devices [21,22], heterostructures [5,8,9], p-n junction devices [18,19] and multilayers [3,23] for their transport and magnetotransport properties.…”

Effect of Incident Light on Transport Properties of Pulsed Laser Deposited Manganite Thin Films

“…Manganite heterostructures show more prominent properties that bulk manganite materials can't, as the exchange energy and hopping energies are tuned at the interfaces [6]. Physical and Microstructural properties of manganite thin films are highly sensitive to the growth conditions, choice of substrate, deposition parameters [7,8] etc. The growth conditions and deposition parameters change with the deposition techniques.…”

Transport studies on La0.8−xPr0.2SrxMnO3 manganite films

“…One of the fruitful endeavors in this field is to grow good quality thin films with appreciably large magnetoresistance (MR) and high ferromagnetic to paramagnetic (FM-PM) transition temperature (T C ) along with metal to insulator/semiconductor (M-I/S) transition temperature (T P ), preferably around room temperature (RT). Structural, transport, magnetotransport and magnetic properties of CMR oxide films are very sensitive to the processing parameters such as deposition technique [3][4][5], growth temperature [6], annealing temperature and environment [7], film thickness [8,9] and substrate used [10]. Amongst all the thin film deposition methods, Chemical Solution Deposition (CSD) is a low cost and simple method for depositing films on large surface areas, as compared to commonly used physical methods such as Pulsed Laser Deposition (PLD), Magnetron Sputtering Deposition (MSD), Molecular Beam Epitaxy (MBE), etc.…”