2019
DOI: 10.1039/c9ja00075e
|View full text |Cite
|
Sign up to set email alerts
|

Glow discharge optical emission spectrometry for quantitative depth profiling of CIGS thin-films

Abstract: The article demonstrates how quantitative compositional depth profiles of Cu(In,Ga)(S,Se)2 layers can be utilized to determine their energy bandgap distribution.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
20
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
9

Relationship

5
4

Authors

Journals

citations
Cited by 34 publications
(20 citation statements)
references
References 37 publications
0
20
0
Order By: Relevance
“…Sheet resistance measurements by four-point probe were done on the AZO layers on top of the CIGSe solar cell stack. GD-OES using a Spectruma GDA 650 tool was applied to the samples in order to determine elemental in-depth profiles following the procedure described in [14]. The quantification of the GD-OES profiles was only possible for the CdS-buffered CIGSe devices, not for the GaO x -buffered CIGSe devices, since a calibration sample for GaO x was not available.…”
Section: Methodsmentioning
confidence: 99%
“…Sheet resistance measurements by four-point probe were done on the AZO layers on top of the CIGSe solar cell stack. GD-OES using a Spectruma GDA 650 tool was applied to the samples in order to determine elemental in-depth profiles following the procedure described in [14]. The quantification of the GD-OES profiles was only possible for the CdS-buffered CIGSe devices, not for the GaO x -buffered CIGSe devices, since a calibration sample for GaO x was not available.…”
Section: Methodsmentioning
confidence: 99%
“…In Figure 8 they are compared to GDOES measurements on samples from the same production run. The depth resolution of GDOES measurements is determined by the curvature of the bottom of the sputtered crater and sputter induced roughening of the samples [ 8 ] and is typically 5 to 10% of the layer thickness [ 4 ].…”
Section: Resultsmentioning
confidence: 99%
“…GDOES was measured at the Helmholtz Zentrum Berlin by order of Avancis using a Spectrum Analytik GDA650 system (GmbH, Hof, Germany) in pulsed radio frequency (rf) mode on samples from the same production run. Details on the measurement, sputter parameters, and quantification procedure can be found in [ 8 ].…”
Section: Methodsmentioning
confidence: 99%
“…In order to characterize the compositional in-depth gradients in the CIGSe absorber, glow-discharge optical emission spectrometry (GD-OES) measurements were performed at HZB and ZSW. The quantification was done following the procedure described in [10]. Current-voltage (jV)-measurements were performed under AM1.5 illumination at 25°C using a Wacom class AAA sun simulator at standard conditions.…”
Section: B Analytical Methodsmentioning
confidence: 99%