1999
DOI: 10.1109/20.800682
|View full text |Cite
|
Sign up to set email alerts
|

Giant interface magnetostriction and temperature dependence in NiFe films encapsulated with Ta and Al/sub 2/O/sub 3/ layers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
10
0

Year Published

2001
2001
2022
2022

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 25 publications
(10 citation statements)
references
References 4 publications
0
10
0
Order By: Relevance
“…Many recent studies [1][2][3][4] have demonstrated that the magnetic properties of NiFe and CoFe layers differ from those in bulk samples of the same composition for layer thicknesses below around 20 nm. The observed changes are a strong function of the seed and capping layer.…”
Section: Introductionmentioning
confidence: 98%
“…Many recent studies [1][2][3][4] have demonstrated that the magnetic properties of NiFe and CoFe layers differ from those in bulk samples of the same composition for layer thicknesses below around 20 nm. The observed changes are a strong function of the seed and capping layer.…”
Section: Introductionmentioning
confidence: 98%
“…9 The difference of s between as-deposition and annealed films mainly comes from the different degrees of intermixing at the interfaces. However s increases abruptly and becomes dramatically more positive when its thickness becomes thinner than 10 nm.…”
Section: Resultsmentioning
confidence: 99%
“…This interest is motivated by the fact that magnetic properties of these types of structures are the real technological issues in mass production of spin-valve read heads and in other important applications like magnetic random access memories and spintronic devices. 1 2 Many recent studies [3][4][5][6][7][8][9] have demonstrated that the magnetic properties of NiFe and CoFe differ from those in bulk samples of the same composition for layer thickness below around 20 nm. The observed changes are a strong function of the seed and capping layer.…”
Section: Introductionmentioning
confidence: 99%