Generation of Gas Discharge Plasma by an Arc Source with a Cold Hollow Cathode

Abstract

The results from a study of an arc plasma source with a cold hollow cathode are presented. The source generates plasma with a density of ~10 10 cm -3 in a volume of ~0.2 m 3 at discharge currents of up to 150 A, an arc discharge operating voltage of 30-40 V, and a low pressure of 0.1-1 Pa. The motion of the cathode spot in the crossed electric and magnetic fields inside the hollow cathode and the cathode's special design make it possible to eliminate almost completely the penetration of the sputtered cathode material into the working vacuum chamber.

Equipment and Technology for Combined Ion–Plasma Strengthening of Cutting Tools

“…In addition to the vacuum arc, magnetron sputtering systems [13][14][15][16][17] and hollow cathode sputtering systems [18][19][20][21][22] can be also used for the coating deposition. In all cases, the coating is bombarded during the synthesis by ions accelerated from the gas discharge plasma [23][24][25][26] or using broad beam sources of ions or fast gas atoms [27][28][29].…”