The vacuum arc is a well-known technique for producing coatings with enhanced adhesion and film density. Many cathodic arc deposition systems are actually in use in industry and research. They all work under (high) vacuum conditions in which water vapour pressure is an important source of film contamination, especially in the pulsed arc mode of operation. Here we present a cathodic arc system working under ultra-high vacuum conditions (UHVCA). We have used for arc ignition a Nd-YAG pulsed laser focused on the cathode surface, which provides a reliable system and allows eliminating all possible sources of contaminants. We have proven that the arc technique produces bulk-like films suitable for superconducting applications. UHVCA has been used to produce ultra-pure niobium films with excellent structural and electrical properties at a deposition temperature lower than 100oC. The UHVCA technique therefore opens up new perspectives for all applications requiring pure films and low deposition temperatures.
Self sustained glow discharge with a hollow cathode was studied at high discharge currents (up to 30 A). Using a grid analyzer placed on the side flange of the hollow cathode, the ion and electron currents flowing in the cathode sheath were measured. At a discharge current of 30 A, pressure of 0.2-2 Pa, and plasma density of 10 11 cm -3 , the coefficient of secondary ion-electron emission γ calculated from the experimental data is found to be 0.1-0.15. The dependences of the plasma parameters on the area of the small anode placed inside the larger hollow cathode are determined.
The performance capabilities of the PINK, a plasma generator with a thermionic cathode mounted in the cavity of a hollow cathode, depending for its operation on a non-self-sustained low-pressure gas discharge have been investigated. It has been shown that when a single-filament tungsten cathode 2 mm in diameter is used and the peak filament current is equal to or higher than 100 A, the self-magnetic field of the filament current significantly affects the discharge current and voltage waveforms. This effect is due to changes in the time and space distributions of the emission current density from the hot cathode. When the electron mean free path is close to the characteristic dimensions of the thermionic cathode, the synthesized plasma density distribution is nonuniform and the cathode is etched nonuniformly. The cathode lifetime in this case is 8-12 h. Using a cathode consisting of several parallel-connected tungsten filaments ∼0.8 mm in diameter moderates the effect of the self-magnetic field of the filament current and nearly doubles the cathode lifetime. The use of this type of cathode together with a discharge igniting electrode reduces the minimum operating pressure in the plasma generator to about one third of that required for the generator operation with a single-filament cathode (to 0.04 Pa).
The results of experimental investigations of the action of the volumetric discharge initiated by an avalanche electron beam on the surface of copper specimens are presented. The volumetric (diffuse) discharge in nitrogen and CO 2 at atmospheric pressure was initiated by applying high voltage pulses of nanosecond duration to a tubular foil cathode. It has been found that the treatment of a copper surface by this type of discharge increases the hardness of the surface layer due to oxidation.
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