2016
DOI: 10.1134/s1063784216050066
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Generation of a pulsed high-current low-energy beam in a plasma electron source with a self-heated cathode

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Cited by 16 publications
(9 citation statements)
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“…For implantation of phosphorus ions in the thin‐film TiO 2 samples, the ion source based on a discharge with the hollow cathode in a magnetic field was used . Red phosphorus powder vaporized as a result of the discharge power dissipation at the cathode.…”
Section: Experimental and Calculation Detailsmentioning
confidence: 99%
See 1 more Smart Citation
“…For implantation of phosphorus ions in the thin‐film TiO 2 samples, the ion source based on a discharge with the hollow cathode in a magnetic field was used . Red phosphorus powder vaporized as a result of the discharge power dissipation at the cathode.…”
Section: Experimental and Calculation Detailsmentioning
confidence: 99%
“…For implantation of phosphorus ions in the thin-film TiO 2 samples, the ion source based on a discharge with the hollow cathode in a magnetic field was used. [13] Red phosphorus powder vaporized as a result of the discharge power dissipation at the cathode. The source was initially started in an argon, then after heating of the cathode and increase of a partial pressure of phosphorus vapors up to 0.01 Pa gas supply stopped and the source turn to a stable operation in the phosphorus vapors with a dc discharge current of 0.2 A.…”
Section: Experimental and Calculation Detailsmentioning
confidence: 99%
“…Arus spot plasma umumnya lebih besar untuk material katoda dengan energi kohesif rendah. Parameter dari spot plasma adalah laju erosi ion (ion erosion rate), sedangkan laju erosi ion merupakan karakteristik dari bahan katoda [8][9][10][11]. Semakin besar arus menuju katoda maka semakin besar spot plasma yang dihasilkan sehingga semakin besar pula material katoda yang tererosi [12][13][14][15].…”
Section: Hasil Dan Pembahasanunclassified
“…Thermionic cathodes are used in deposition devices of this type as an electron emitter, usually, which quickly degrade in chemically active gases; therefore, thermionic vacuum arc (TVA) method is mainly used for deposition of metal coatings [1]. To obtain binary coatings by reactive evaporation, arcs with a self-heating hollow cathode (SHC) are used, which are able to function stably for a long time under conditions of pumping an inert gas (or N2) through the cathode cavity and supplying the reaction gas to the discharge gap [2], both in continuous and pulse-periodic (10-1000 Hz, 10-100 ms) modes [3]. Oxide [4], nitride [5], and composite [6] coatings are obtained by reaction anode evaporation in a discharge with SHC at a rate of more than 1 μm/h.…”
Section: Introductionmentioning
confidence: 99%