We report bulk GaInNAs p − i − n photodiodes lattice-matched to GaAs substrates, grown by solid source molecular beam epitaxy with photoresponses out to ϳ1.3 m. The as-grown samples were characterized optically, structurally, and electrically. A low background doping concentration in the range of 10 14 -10 15 cm −3 was obtained in the samples. One of the samples with a 0.5 m thick GaInNAs absorbing layer gave a responsivity of 0.11 A/W for a band edge of 1.28 m at reverse bias of 2 V.