1983
DOI: 10.1109/jqe.1983.1072000
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GaInAsP/InP surface emitting injection lasers with short cavity length

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Cited by 40 publications
(4 citation statements)
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“…In this article we refer this approach of fabricating DBR mirrors as non-epitaxial or dielectric DBRs, interchangeably. After the conceptual proposal of VCSEL by K. Iga in 1977 [23], dielectric DBRs and/or metal reflectors were the only options toward the realization of this novel device [24][25][26][27]. However, since the semiconductor gain region (a double heterostructure, DH, or multiple quantum wells, MQWs) of a VCSEL needs to be prepared epitaxially on a single crystalline substrate, major fabrication efforts had to be exerted to remove the single crystalline substrates, or to expose the backside of the active region, and to coat both the top and bottom surfaces of the gain region with non-epitaxial DBR mirrors.…”
Section: Fabrication Techniques Of Dbrsmentioning
confidence: 99%
“…In this article we refer this approach of fabricating DBR mirrors as non-epitaxial or dielectric DBRs, interchangeably. After the conceptual proposal of VCSEL by K. Iga in 1977 [23], dielectric DBRs and/or metal reflectors were the only options toward the realization of this novel device [24][25][26][27]. However, since the semiconductor gain region (a double heterostructure, DH, or multiple quantum wells, MQWs) of a VCSEL needs to be prepared epitaxially on a single crystalline substrate, major fabrication efforts had to be exerted to remove the single crystalline substrates, or to expose the backside of the active region, and to coat both the top and bottom surfaces of the gain region with non-epitaxial DBR mirrors.…”
Section: Fabrication Techniques Of Dbrsmentioning
confidence: 99%
“…Although the VCSEL structure is designed for vertical emission, light can propagate in the plane of the VCSEL material [15][16][17][18][19]. In many cases, the in-plane mode can propagate with low optical loss, as the separate confinement heterostructure (SCH) effectively forms a multi-layer slab waveguide [16,17].…”
Section: Authorsmentioning
confidence: 99%
“…5) can further reduce the thickness of the active layer to the nano-level producing the quantum effect. It makes the limitation of carriers and light fields be further strengthened and the forbidden bandwidth reduce from E g to E gw [30], [31]. Based on these characteristics, the loss of the particle conversion in semiconductor gain can be quite small, and the threshold value is also greatly reduced.…”
Section: Beam Energy Generation Modelmentioning
confidence: 99%