2022
DOI: 10.1039/d1nh00553g
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GaAs nanowires on Si nanopillars: towards large scale, phase-engineered arrays

Abstract: Large-scale patterning for vapor-liquid-solid growth of III-V nanowires is a challenge given the required feature size for patterning (45 to 60nm holes). In fact, arrays are traditionally manufactured using electron-beam...

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Cited by 4 publications
(1 citation statement)
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“…[62] The ensemble of the top-down approach via RIE and a hard mask defined by EBL ensures a high reproducibility of the NW array fabrication virtually without any defects such as missing or askew NWs which is common in bottomup approaches. [63][64][65] A defect-free nature of the NW arrays, however, was crucial to study the general impact of the NW arrays on the neuronal differentiation. Single missing NWs, for example, in P5 NW arrays would appear as P10 NW arrays to individual cells-or even as a flat since the cells might fit completely in between the NWs without any further interaction.…”
Section: Discussionmentioning
confidence: 99%
“…[62] The ensemble of the top-down approach via RIE and a hard mask defined by EBL ensures a high reproducibility of the NW array fabrication virtually without any defects such as missing or askew NWs which is common in bottomup approaches. [63][64][65] A defect-free nature of the NW arrays, however, was crucial to study the general impact of the NW arrays on the neuronal differentiation. Single missing NWs, for example, in P5 NW arrays would appear as P10 NW arrays to individual cells-or even as a flat since the cells might fit completely in between the NWs without any further interaction.…”
Section: Discussionmentioning
confidence: 99%