2019
DOI: 10.1134/s1063782619090021
|View full text |Cite
|
Sign up to set email alerts
|

GaAs/GaP Quantum-Well Heterostructures Grown on Si Substrates

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

1
1
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(2 citation statements)
references
References 17 publications
1
1
0
Order By: Relevance
“…The displayed values are obtained with accuracy better than 10 −2 %.ple S with at low T is thermally quenched via electronthermalization from X xy in IL to, most likely, nitrogen complexes present in the structure from GaP growth[73], having escape energies of 8 ± 2 meV, in good agreement with Ref.[74]. For larger temperatures, the dominant mechanism of quenching with escape energies ∼60 meV is most likely the escape of electron from X xy -valley in IL to X-valley in bulk (41 meV determined from 8-band k • p, 43 ± 7 meV observed in Ref [75]…”
supporting
confidence: 87%
“…The displayed values are obtained with accuracy better than 10 −2 %.ple S with at low T is thermally quenched via electronthermalization from X xy in IL to, most likely, nitrogen complexes present in the structure from GaP growth[73], having escape energies of 8 ± 2 meV, in good agreement with Ref.[74]. For larger temperatures, the dominant mechanism of quenching with escape energies ∼60 meV is most likely the escape of electron from X xy -valley in IL to X-valley in bulk (41 meV determined from 8-band k • p, 43 ± 7 meV observed in Ref [75]…”
supporting
confidence: 87%
“…is merger is becoming increasingly important for future high-speed technologies [1]. Due to the indirect energy band of Si, the main focus is on the monolithic growth of direct-band III-V binary compounds on an Si substrate [2].…”
Section: Introductionmentioning
confidence: 99%