GaAs-based, single-stage, intersubband devices with active regions composed of deep quantum wells (i.e., In 0.3 Ga 0.7 As) and high AlGaAs barriers display strong room-temperature emission at = 4.7 m. The structures are grown by metalorganic chemical vapor deposition. The large energy barriers ͑ϳ360 meV͒ for electrons in the upper energy level of the active region strongly suppress both the carrier leakage as well as the tunneling escape rate out of the wells. As a result, the ratio of emissions at 80 and 300 K is as low as 2.0, and thus there is considerably less need for a Bragg mirror/transmitter-type region. Devices with virtually 100% tunneling injection efficiency have been realized, and their room-temperature spectra are narrow: 25 meV full width at half maximum. In the quest to achieve efficient, room-temperature (RT), continuous-wave (cw) laser operation in the mid-infrared (IR) wavelength range (i.e., 3 -5 m) one proposed approach is the use of two-dimensional arrays of unipolar quantum boxes 1 (QBs), with each QB incorporating a singlestage, intersubband-transition structure. In previous work on single-stage, unipolar devices RT intersubband emission has been reported only from InP-based structures 2 at a wavelength of 7.7 m. For 30-to 40-stage GaAs-AlGaAs quantum-cascade (QC) lasers at RT, intersubband emission wavelengths shorter than 8 m cannot be achieved, since at higher transition energies the active-region upper level is apparently depopulated via resonant tunneling between the X valleys of the surrounding AlGaAs barriers. 3 We present here the realization of RT mid-IR electroluminescence emission from single-stage intersubband devices. The RT output power is of the same order of magnitude as that of InP-based QC structures of approximately the same wavelength. The RT emission linewidth is narrow [ϳ25 meV full width at half maximum (FWHM)] and the 80" 300 K emission ratio is very low ͑ϳ2͒.Optimization studies of GaAs-based devices 4 have shown that for thin barriers between the injector region and the active region, two effects occur which cause significant decreases in the upper-(energy) state injection efficiency: (1) a diagonal radiative transition from the injector-region ground state, g, to an active-region lower state, and (2) severe carrier leakage from the state g to the continuum. Here we show that by using GaAs-based devices with very deep active quantum wells (QWs), In 0.3 Ga 0.7 As active layers sandwiched between Al 0.8 Ga 0.2 As barriers, we can virtually suppress carrier leakage to the continuum. Furthermore, since GaAs/ AlGaAs superlattices do not need to be used on both sides of the active region, resonant tunneling cannot occur between X valleys at high transition energies, and thus RT emission in the mid-IR range becomes possible for GaAs-based devices.The material used in the devices is grown by lowpressure metalorganic chemical vapor deposition (MOCVD) at 700°C and is essentially a single-stage structure embedded in a plasmon-enhanced n-GaAs waveguide, 3,4 which gives an op...