2006
DOI: 10.1063/1.2218027
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Ga In P ∕ Ga As double heterojunction bipolar transistor with GaAs∕Al0.11Ga0.89As∕GaInP composite collector

Abstract: Ga In P ∕ Ga As ∕ Ga In P double heterojunction bipolar transistor (DHBT) with an Al0.11Ga0.89As layer within lowly doped GaAs–GaInP composite collector was characterized. In comparison to an abrupt GaInP∕GaAs∕GaInP DHBT with saturation voltages in excess of 20V, current gains of 25 at high biases, and breakdown voltages in the range of 22V, the DHBT incorporating GaAs–Al0.11Ga0.89As–GaInP composite collector has demonstrated lower saturation voltages of less than 6V and high current gains of 50 without compro… Show more

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Cited by 5 publications
(3 citation statements)
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“…The ternary gallium indium phosphide (GaInP) alloy is widely used in bipolar transistors [1][2][3], in various heterojunction nanostructures [4,5], as well as in efficient single and multijunction solar cells as the largest bandgap top cell [6][7][8]. Moreover, cells based on GaInP 2 lattice-matched with GaAs or Ge substrates are very promising for solar water splitting [9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…The ternary gallium indium phosphide (GaInP) alloy is widely used in bipolar transistors [1][2][3], in various heterojunction nanostructures [4,5], as well as in efficient single and multijunction solar cells as the largest bandgap top cell [6][7][8]. Moreover, cells based on GaInP 2 lattice-matched with GaAs or Ge substrates are very promising for solar water splitting [9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…Gallium indium phosphide (GaInP) is a ternary semiconductor compound applicable in heterojunction electronic devices and nanostructures. , In addition, GaInP 2 is widely used as the largest bandgap top cell in efficient single and multijunction solar cells, and it has been employed for photoelectrochemical water splitting, , as its band gap of 1.8–1.9 eV is large enough to cover the difference between H 2 /H 2 O and O 2 /H 2 O redox potentials.…”
Section: Introductionmentioning
confidence: 99%
“…The onset of multiplication and breakdown can be confined in the larger band-gap GaInP collector for improved breakdown performance, provided the dead-space width is larger than the combined width of the lowly doped GaAs spacer and the highly doped GaInP spacer. 6 The base sheet resistance for DHBT-I and DHBT-II is measured to be 290 ⍀ / ᮀ and 290 ⍀ / ᮀ, respectively. The same analytical model was revised to study the performance of GaInP/GaAs/GaInP DHBTs ͑DHBT-II͒ using a lowly doped GaAs spacer in combination with a lowly doped Al 0.11 Ga 0.89 As spacer.…”
mentioning
confidence: 99%