2012
DOI: 10.1016/j.jcrysgro.2012.05.006
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Ga-assisted MBE growth of GaAs nanowires using thin HSQ layer

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Cited by 81 publications
(112 citation statements)
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“…14,21,22 Consequently, the nanowire diameter is found to be widely insensitive to the parameters of the implantation process. Minor deviations in the diameter with respect to nanowires at random positions can mainly be explained by a local variation of the nanowire density and therefore the III/V ratio.…”
Section: Discussionmentioning
confidence: 99%
“…14,21,22 Consequently, the nanowire diameter is found to be widely insensitive to the parameters of the implantation process. Minor deviations in the diameter with respect to nanowires at random positions can mainly be explained by a local variation of the nanowire density and therefore the III/V ratio.…”
Section: Discussionmentioning
confidence: 99%
“…The SiO x layer was prepared by a thermal spin-coating process from a hydrogen silsesquioxane (HSQ) film. 18 The GaAs NWs were grown at a substrate temperature of 590 C with a Ga rate of 0.075 lm h À1 and an As 4 beam equivalent pressure of $1.3 Â 10 À6 mbar for 45 min. 18 For the vapor-solid overgrowth of GaAs by InAs, the temperature was reduced to 490 C and the Influx was fixed to 0.1 lm h À1 .…”
Section: Methodsmentioning
confidence: 99%
“…For example, there are a number of investigations where the diameter of the droplet is considerably larger than the solid-liquid interface (many of these are self-catalysed wires), and the structure is found to be predominantly ZB [28][29][30][31][32][33] . In contrast, most studies which find predominantly WZ structure find a contact angle close to 90°(in cases where contact angle was shown or reported) 7,12,34,35 .…”
Section: Methodsmentioning
confidence: 99%