Fundamental solutions for real-time optical CD metrology

Opsal, Jon; Chu, Hang; Wen, Youxian; Chang, Yia‐Chung; Li, Guangwei

doi:10.1117/12.473448

Cited by 29 publications

(8 citation statements)

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“…In all of these approaches the calculation time required prohibits the determination of the CD in real time. Database libraries have to be generated for each application where search and match algorithms have to be developed to find the spectrum that best fits the experimental spectrum [46][47][48]. To speed up the fitting process, there were attempts to develop faster algorithms, however analytic approaches will be very useful.…”

Section: Scatterometry Based Non-resonant Sensormentioning

confidence: 99%

Resonant and scatterometric grating-based nanophotonic structures for biosensing

Auslender

2007

J. Nanophoton

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Resonant and non-resonant phenomena in grating based photonic structures were investigated as biological and biochemical sensors particularly for water contaminants. Detectivity on the order of 10 -6 RIU was found to be possible. Spectroscopic scatterometry in conical mounting at normal incidence was found to offer high sensitivity and it allows specificity in addition to refractive-index-variation measurement.

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Section: Scatterometry Based Non-resonant Sensormentioning

confidence: 99%

Resonant and scatterometric grating-based nanophotonic structures for biosensing

Auslender

2007

J. Nanophoton

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“…Information about these and other aspects can be found in the Proceedings of the Third International Conference on Spectroscopic Ellipsometry [4] and a recently published collection of monographs on the same topic [5]. However, the basic technology is also changing, being driven not by growth applications but by the so-called real-time critical-dimensions (RT/CD) measurement opportunity provided by integrated-circuits technology [6]. The need here is to determine accurately the critical dimensions, i.e., the height, width, pitch, sidewall taper, possibility of undercutting or incomplete material removal, etc., of The necessity for RT/CD measurements can be appreciated as follows.…”

Section: Introductionmentioning

confidence: 99%

“…3 [6]. The left side shows a schematic of the cross section of a line that has been etched in a laminar structure consisting of a crystalline Si substrate, an epitaxial Si overlayer, an SiO 2 passivating layer, and a Si 3 N 4 cap.…”

Section: Introductionmentioning

confidence: 99%

Real‐time diagnostics for metalorganic vapor phase epitaxy

Aspnes

2005

Physica Status Solidi (b)

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Metalorganic vapor phase epitaxy is a complicated process whereby constituents of incoming reactant species are incorporated into the growing crystal through a number of stages. A range of optical probes has been developed to provide detailed information about these stages and the sample as growth proceeds. While many of these probes are mature, spectroscopic ellipsometry (SE) and polarimetry (SP) are both undergoing rapid improvements as a result of applications in integrated-circuits technology. Here, I review some of these advances and the motivation behind them, and illustrate capabilities with an application regarding the heteroepitaxial growth of GaSb on GaAs.

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“…In all of these approaches the calculation time required prohibits the determination of the CD in real time. Database libraries have to be generated for each application where search and match algorithms have to be developed to find the spectrum that best fits the experimental spectrum 10,11,12 . To speed up the fitting process, there were attempts to develop faster algorithms, however analytic approaches will be very useful.…”

Section: Introductionmentioning

confidence: 99%

Optical scatterometry with analytic approaches applied to periodic nano-arrays including anisotropic layers

Abdulhalim

2007

SPIE Proceedings

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Optical scatterometry is being used as a powerful technique for measurement of sub-wavelength periodic structures. It is based on measuring the scattered signal and solving the inverse scattering problem. For periodic nano-arrays with feature size less than 100nm, it is possible to simplify the electromagnetic simulations using the Rytov near quasi-static approximation valid for feature periods only few times less than the wavelength. This is shown to be adequate for the determination of the structure parameters from the zero order reflected or transmitted waves and their polarization or ellipsometric properties. The validity of this approach is applied to lamellar nano-scale grating photo-resist lines on Si substrate. Formulation for structures containing anisotropic multilayers is presented using the 4x4 matrix approach.

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Fundamental solutions for real-time optical CD metrology

Cited by 29 publications

References 0 publications

Resonant and scatterometric grating-based nanophotonic structures for biosensing

Resonant and scatterometric grating-based nanophotonic structures for biosensing

Real‐time diagnostics for metalorganic vapor phase epitaxy

Optical scatterometry with analytic approaches applied to periodic nano-arrays including anisotropic layers

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