Fundamental investigations in plasma modification of polymers

Meichsner, Jürgen; Nitschke, Mirko; Rochotzki, R.; Zeuner, Michael

doi:10.1016/0257-8972(95)08324-3

Cited by 41 publications

(25 citation statements)

References 7 publications

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“…The exposure of silica is roughly the same (3.5% vs 2.4%) for both membranes. Clearly, the ablation of the membrane's top layer is much slower in a CF 4 plasma making it a milder etchant than a CO 2 plasma (8,30). Perhaps the most plausible reason for the lack of silicium at the treated membrane's surface is found in surface restructuring during CF 4 plasma-treatment.…”

Section: Surface Analysis Of the Membranes' Top Layermentioning

confidence: 98%

Tailoring the Properties of Asymmetric Cellulose Acetate Membranes by Gas Plasma Etching

riekerink

Engbers

Weßling

et al. 2002

Journal of Colloid and Interface Science

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Section: Surface Analysis Of the Membranes' Top Layermentioning

confidence: 98%

Tailoring the Properties of Asymmetric Cellulose Acetate Membranes by Gas Plasma Etching

riekerink

Engbers

Weßling

et al. 2002

Journal of Colloid and Interface Science

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“…The broad and overlapped specin situ with an electronic microbalance during the tral features of the CF x species are caused by a fluorination in a CF 4 plasma. 26 In the first 20 s of strong coupling of the C{F vibration with vibrathe microgravimetric experiment, the mass of the tions of the polymer backbone.…”

Section: Experiments In Detail Nitrogenmentioning

confidence: 99%

“…As a side effect, the spectroscopy (ARXPS), 1,28,29 Rutherford back-TFAA reaction causes a diminishing of the scattering (RBS), 30 secondary ion mass spectrosplasma-induced carbonyl band at 1726 cm 01 . The copy (SIMS), 4 microgravimetry, 26 and gelation removal of low molecular weight products from measurements 31 were used to determine depth profiles.…”

Section: Depth Profilesmentioning

confidence: 99%

Low-pressure plasma polymer modification from the FTIR point of view

Nitschke

Meichsner

1997

J. Appl. Polym. Sci.

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ABSTRACT:The main scope of this article was to demonstrate the potential of Fourier transform infrared (FTIR) spectroscopy as a diagnostic tool for low-pressure plasma polymer modification. Two model polymers, polyethylene and polystyrene, were treated in radio-frequency (rf) discharges in argon, hydrogen, oxygen, nitrogen, and tetrafluoromethane. In situ FTIR analysis was based on infrared reflection absorption spectroscopy (IRRAS) and attenuated total reflection (ATR). For both techniques, thin-film samples were prepared from polymer solution. The effects appearing in the infrared spectra are discussed. The results are compared with those from other diagnostic techniques.

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“…Plasma polymerisation refers to the formation of polymerised material by use of a monomer in the plasma state 7 and can be used to effectively modify surfaces with a thin, well adherent polymer layer that, by the choice of the monomer, contains the desired functional groups without altering the substrates bulk properties. Plasma polymerisation has been achieved with monomers containing alcohol, amine and carbonyl functional groups to produce plasma polymers with equivalent functionality [8][9][10][11] . We have previously used allylamine as a monomer to produce an amine-rich allylamine plasma polymer (ALAPP) with subsequent grafting of poly(ethylene oxide) (PEO) 6 .…”

Section: Introductionmentioning

confidence: 99%