Twelve subjects provided shape and orientation judgments for a set of projectively equivalent, variously rotated rectangles under three viewing conditions-monoptic, dichoptic, and binocular-with and without the presence of a pattern mask. In the absence of the mask, partial constancy was exhibited under the first two conditions and near perfect constancy under the binocular condition. Orientation was discriminated. Presence of the mask produced projective shape matching and diminished orientation discrimination. It is argued that the site of masking was postchiasmal, and the results are related to previous work with pattern masking of projectively equivalent ellipses.In previous experiments, Epstein and Hatfield (1978) and Epstein, Hatfield, and Muise (1977) reported masking of simple shapes rotated in depth. When followed by a frontoparallel pattern mask at the appropriate interstimulus interval (lSI), objectively different, projectively identical shapes-at-aslant were indistinguishable. The targets all appeared to conform to projective shape. The targets, which were rotated in depth as much as 65 0 , tended to appear to have a frontoparallel orientation.We proposed that the mask affected perceived shape by preempting the visual system before the optical correlates of slant-in-depth could be processed. We assumed in our account that the site of the masking effect was postchiasmal. The aim of the experiment described here was to test this assumption. For this purpose, we employed the conventional paradigm. In this paradigm, inferences concerning the locus of an effect are based on a comparison between two conditions: (1) dichoptic viewing, which exposes the target to one eye and the mask to the other, and (2) monoptic viewing, which exposes the target and the mask to the same eye. If masking effects of equal magnitude are observed under dichoptic and monoptic conditions, we may infer that the site of the effect is postchiasmal. The absence or diminution of masking for dichoptic viewing would implicate a retinal locus. A binocular viewing condition which exposed the target and the mask to both eyes was included to serve as a baseline for constancy and masking effects.It was expected that only partial constancy would be obtained in the two monocular (monoptic, dichoptic) conditions. Epstein and Hatfield (1978) used projectively equivalent ellipses as stimuli and found that, at exposure durations varying from 25 to 75 msec, binocular viewing yielded nearly perfect constancy and monocular viewing without a mask