Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

Chen, Yu-Tung; Lo, T. N.; Chu, Yong S.; Yi, Jaemock; Liu, Chi-Jen; Wang, Jun-Yue; Wang, Cheng-Liang; Chiu, C.-W.E.; Hua, Tzu-En; Hwu, Y.; Shen, Qun; Yin, Gung‐Chian; Liang, K. S.; Li, Hongming; Je, Jung Ho; Margaritondo, G.

doi:10.1088/0957-4484/19/39/395302

Cited by 87 publications

(57 citation statements)

References 12 publications

(15 reference statements)

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“…However, this cannot be achieved by using commonly used developers such as a 1:3 ratio mixture of MIBK (methylisobutylketone) and IPA (2-propanol). It is shown (Y. T. Chen et al, 2008) that a specific mixing IPA and water can produce sufficient contrast and precision for high-aspect-ratio FZP patterns. The final metal nanostructure was obtained by gold electrodeposition in the open trenches of the resist pattern.…”

Section: Hard X-ray Fresnel Zone Platesmentioning

confidence: 99%

High-energy Electron Beam Lithography for Nanoscale Fabrication

Wu¹,

Makiuchi²,

Chen³

2010

Lithography

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Section: Hard X-ray Fresnel Zone Platesmentioning

confidence: 99%

High-energy Electron Beam Lithography for Nanoscale Fabrication

Wu¹,

Makiuchi²,

Chen³

2010

Lithography

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“…Nevertheless, the versatility and robust performance of FZPs make them one of the most attractive optics in the complete X‐ray range. Therefore, great efforts are being made to develop hard X‐ray FZPs 20, 33, 34, 35, 36, 37, 38…”

Section: Introductionmentioning

confidence: 99%

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

et al. 2018

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Focusing X‐rays to single nanometer dimensions is impeded by the lack of high‐quality, high‐resolution optics. Challenges in fabricating high aspect ratio 3D nanostructures limit the quality and the resolution. Multilayer zone plates target this challenge by offering virtually unlimited and freely selectable aspect ratios. Here, a full‐ceramic zone plate is fabricated via atomic layer deposition of multilayers over optical quality glass fibers and subsequent focused ion beam slicing. The quality of the multilayers is confirmed up to an aspect ratio of 500 with zones as thin as 25 nm. Focusing performance of the fabricated zone plate is tested toward the high‐energy limit of a soft X‐ray scanning transmission microscope, achieving a 15 nm half‐pitch cut‐off resolution. Sources of adverse influences are identified, and effective routes for improving the zone plate performance are elaborated, paving a clear path toward using multilayer zone plates in high‐energy X‐ray microscopy. Finally, a new fabrication concept is introduced for making zone plates with precisely tilted zones, targeting even higher resolutions.

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“…Despite the success of FZPs in soft X-ray (SXR) microscopy which was facilitated by developments in the conventional fabrication technique of e-beam lithography (EBL), the development of FZPs for HXR remained challenging due to the need for very high aspect ratios which are usually out of limits of EBL (A r of up to about 25 is achievable with increasingly complex techniques) [14,15]. Recently, there have been improvements in focusing of HXR via various diffractive optics such as, multilayer Laue lenses, lithographic and multilayer FZPs achieving high resolutions and efficiencies [1,[16][17][18][19][20][21][22][23]. FZPs based on multilayer fabrication techniques (ML-FZPs) where a fiber core is coated with a multilayer and sliced to deliver the ML-FZP, overcome the problem of achieving a high aspect ratio by the nature of the fabrication method [19,[24][25][26][27][28][29][30][31][32].…”

Section: Introductionmentioning

confidence: 99%

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Keskinbora¹,

Robisch²,

Mayer³

et al. 2014

Opt. Express

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X-ray microscopy is a successful technique with applications in several key fields. Fresnel zone plates (FZPs) have been the optical elements driving its success, especially in the soft X-ray range. However, focusing of hard X-rays via FZPs remains a challenge. It is demonstrated here, that two multilayer type FZPs, delivered from the same multilayer deposit, focus both hard and soft X-rays with high fidelity. The results prove that these lenses can achieve at least 21 nm half-pitch resolution at 1.2 keV demonstrated by direct imaging, and sub-30 nm FWHM (fullpitch) resolution at 7.9 keV, deduced from autocorrelation analysis. Reported FZPs had more than 10% diffraction efficiency near 1.5 keV. ©2014 Optical Society of AmericaOCIS codes: (340.7460) X-ray microscopy; (340.0340) X-ray optics; (340.6720) Synchrotron radiation; (340.7480) X-rays, soft x-rays, extreme ultraviolet (EUV); (050.1965) Diffractive lenses; (220.4241) Nanostructure fabrication. References and links1. J. Vila-Comamala, Y. Pan, J. J. Lombardo, W. M. Harris, W. K. S. Chiu, C. David, and Y. Wang, "Zonedoubled Fresnel zone plates for high-resolution hard X-ray full-field transmission microscopy," J. Synchrotron Radiat. 19(5), 705-709 (2012). 2. E. Zschech, C. Wyon, C. E. Murray, and G. Schneider, "Devices, materials, and processes for nanoelectronics: characterization with advanced x-ray techniques using lab-based and synchrotron radiation sources," Adv. Eng. Mater. 13(8), 811-836 (2011 Schütz, "Fast spin-wave-mediated magnetic vortex core reversal," Phys. Rev. B 86(13), 134426 (2012). 5. J. Kirz and C. Jacobsen, "The history and future of X-ray microscopy," J. Phys. Conf. Ser. 186, 012001 (2009). 6. P. Kirkpatrick and A. V. Baez, "Formation of optical images by X-Rays," J. Opt. Soc. Am. 38(9), 766-774 (1948 International Journal of Optics 31(4), 403-413 (1984). 46. A. A. Michelson, Studies in Optics (Dover Publications, Incorporated, 1995. 47. G. R. Morrison, "Phase contrast and darkfield imaging in x-ray microscopy," Proc. SPIE 1741, 186-193 (1993).

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Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

Cited by 87 publications

References 12 publications

High-energy Electron Beam Lithography for Nanoscale Fabrication

High-energy Electron Beam Lithography for Nanoscale Fabrication

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

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