Full characterization of a focused wave field with sub 100 nm resolution

Hoppe, Robert; Meier, V.A.; Patommel, Jens; Seiboth, Frank; Lee, Hae Ja; Nagler, Bob; Galtier, E.; Arnold, Brice; Zastrau, U.; Hastings, J. B.; Nilsson, Daniel; Uhlén, Fredrik; Voigt, Ulrich; Hertz, Hans M.; Schroer, Christian G.; Schropp, Andreas

doi:10.1117/12.2020856

Cited by 3 publications

(2 citation statements)

References 22 publications

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“…Due to the extremely short X-ray pulse duration of 50 fs the sample is frozen in space during each exposure. Thus, we did not employ a sophisticated reconstruction algorithm accounting for incoherence due to sample movement during exposure, [28][29][30] but could use a simple ePIE algorithm 31 with iterative position refinement 11,32 for data collected at all facilities.…”

Section: Wavefield Characterization By Ptychographymentioning

confidence: 99%

Aberration correction for hard x-ray focusing at the nanoscale

Seiboth

Schropp

Scholz

et al. 2017

Advances in X-Ray/Euv Optics and Components XII

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We developed a corrective phase plate that enables the correction of residual aberration in reflective, diffractive, and refractive X-ray optics. The principle is demonstrated on a stack of beryllium compound refractive lenses with a numerical aperture of 0.49 × 10 −3 at three different synchrotron radiation and x-ray free-electron laser facilities. By introducing this phase plate into the beam path, we were able to correct the spherical aberration of the optical system and improve the Strehl ratio of the optics from 0.29(7) to 0.87(5), creating a diffraction-limited, large aperture, nanofocusing optics that is radiation resistant and very compact.

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Section: Wavefield Characterization By Ptychographymentioning

confidence: 99%

Aberration correction for hard x-ray focusing at the nanoscale

Seiboth

Schropp

Scholz

et al. 2017

Advances in X-Ray/Euv Optics and Components XII

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“…Our ptychography algorithm is based on the ePIE 7 and enhanced by a position refinement. 19 With the reconstructed complex-valued wave field and using the Fresnel-Kirchhoff diffraction integral the complete beam caustic as shown in Fig. 2a) can be reconstructed.…”

Section: Basic Wave Field Characterization Using Ptychographymentioning

confidence: 99%

Quantitative characterization of aberrations in x-ray optics

et al. 2016

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Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. However, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

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