1991
DOI: 10.1016/0039-6028(91)90038-t
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FTIR studies of H2O and D2O decomposition on porous silicon surfaces

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Cited by 196 publications
(138 citation statements)
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“…These higher energy Si ± H x vibrations are characteristic of Si ± H species that have oxygen atoms bound to the Si atom. [17] Figure 4 also shows that the loss in intensity of the n (Si±Hx) band is offset by increased intensity in the n (OSi±Hx) band. Traces of surface-adsorbed DNT are also detected in the FTIR spectrum as absorptions at 1550 and 1340 cm À1 , which resemble those in the FTIR spectrum in a KBr pellet sample of DNT.…”
mentioning
confidence: 83%
“…These higher energy Si ± H x vibrations are characteristic of Si ± H species that have oxygen atoms bound to the Si atom. [17] Figure 4 also shows that the loss in intensity of the n (Si±Hx) band is offset by increased intensity in the n (OSi±Hx) band. Traces of surface-adsorbed DNT are also detected in the FTIR spectrum as absorptions at 1550 and 1340 cm À1 , which resemble those in the FTIR spectrum in a KBr pellet sample of DNT.…”
mentioning
confidence: 83%
“…A d Si-H 2 scissor mode absorption is present at 908 cm ±1 , and features associated with Si lattice modes appear at 627 and 667 cm ±1 . [8,9] Upon exposure of the sample to the anionic surfactant SDSulfonate, new bands appear in the FTIR spectrum at 2930, 2847, 1469, and 1184 cm ±1 (Fig. 1B).…”
Section: Porous Si Samples Exposed To the Anionic Surfactant Sodium Dmentioning
confidence: 99%
“…5) show that extensive oxidation of the surface occurs upon treatment with aqueous DTAB. After exposure, a strong band at 1072 cm ±1 assigned to a m Si-O vibrational mode is observed, [8,9] along with bands assigned to aliphatic m C-H stretching modes of the surfactant at 2923 and 2858 cm ±1 (Fig. 5B).…”
Section: Porous Si Samples Exposed To the Cationic Surfactant Dodecylmentioning
confidence: 99%
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“…Porous silicon (PS) is a semiconductor in nanocrystalline form (NPS), which could improve some properties of silicon, given that some properties, such as the electricals, are determined by the short range order of atoms, rather than by the long range order. In recent years, the great interest in NPS has been due to the high surface area of porous silicon, which has been useful as a model of crystalline silicon surfaces in spectroscopic studies (Anderson et al, 1990;Bisi et al, 2000;Dillon et al, 1992;Gupta et al, 1991), as a precursor to generate thick oxide layers on silicon and as a dielectric layer in capacitance chemical sensors. In addition, NPS has been applied in optoelectronics, micro-optics, energy conversion, environmental monitoring, wafer technology, micromachining and biotechnology.…”
Section: Introductionmentioning
confidence: 99%