2017
DOI: 10.1002/slct.201700573
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From Tetrahedral Tetraphosphonic Acids E[p -C6 H4 P(O)(OH)2 ]4 (E=C, Si) to Porous Cu- and Zn-MOFs with Large Surface Areas

Abstract: 3) obtained using the tetrahedral linkers tetraphenylmethane tetrakis-4-phosphonic acid (H 8 MTTPA) and tetraphenylsilane tetrakis-4-phosphonic acid (H 8 STPPA) under solvothermal conditions. X-ray structures reveal 3D frameworks with large assessable voids. The percentage void volumes and the specific BET surface areas of 1 (48.7 %, 794 m 2 /g), 2 (48.1 %, 565 m 2 /g) and 3 (51.3 %, 927 m 2 /g) predicted by molecular simulations are among the highest reported for MOFs derived from phosphonic acids.

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Cited by 25 publications
(29 citation statements)
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References 36 publications
(6 reference statements)
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“…The phosphonic acid functional group has two protons and one oxygen from the P=O bond, which allow it to form multiple hydrogen bonds with other phosphonic acid groups and thereby stabilize the resulting HOF. Interestingly, the unique structure and multiple metal binding modes of the phosphonic acid functional group have led to some of the most thermally [34,[43][44][45][46] and chemically stable [34,[47][48][49] MOFs in 5 the literature. The phosphonic acid functional group R-PO3H2 involves two deprotonation modes with pKa values of 1.7 and 7.4, respectively.…”
mentioning
confidence: 99%
“…The phosphonic acid functional group has two protons and one oxygen from the P=O bond, which allow it to form multiple hydrogen bonds with other phosphonic acid groups and thereby stabilize the resulting HOF. Interestingly, the unique structure and multiple metal binding modes of the phosphonic acid functional group have led to some of the most thermally [34,[43][44][45][46] and chemically stable [34,[47][48][49] MOFs in 5 the literature. The phosphonic acid functional group R-PO3H2 involves two deprotonation modes with pKa values of 1.7 and 7.4, respectively.…”
mentioning
confidence: 99%
“…From the tetraphosphonic acids, 6 was described previously, whereas 7 and 8 are new compounds. The tetrabiphenylsilane tetrakis‐4‐phosphonic acid ( 7 ) is a topological analog of tetraphenylmethane tetrakis‐4‐phosphonic acid and tetraphenylsilane tetrakis‐4‐phosphonic acid, which was recently used for the preparation of Cu and Zn‐based MOFs showing very high surface areas , . Notably, both tetraphosphonic acids were prepared from the same starting material, namely tetrakis(4‐bromophenyl)silane.…”
Section: Resultsmentioning
confidence: 99%
“…Up to the early 2000s, most metal‐organophosphonates possessed highly dense pillared‐layered and lamellar structures because their syntheses relied on structurally flexible alkylphosphonate linkers . More recently, with the introduction of the rigid tetratopic arylphosphonate linkers, such as the square planar tetra(4‐phosphonophenyl)porphyrin and the tetrahedral tetraphenylmethane tetrakis‐4‐phosphonic acid precluded the formation of dense 2D metal oxide layers. Their introduction has increased the distances between the organophosphonate adhesive units and favored the formation of metal oxide clusters and stable one‐dimensional inorganic building units to form one‐dimensional hexagonal void channels or porous diamandoid networks.…”
Section: Introductionmentioning
confidence: 99%
“…With this type of rigid ligand, high catalytic and proton conductivities, up to 2.58 × 10 −2 S·cm −1 , were found [16]. Tetraphosphonates with a tetrahedral structure have been also published [17,18]. Recently, a review on tetraphenylmethane (TPPM) and tetraphenylsilane (TPPSi) as building units of coordination polymers has been reported [19].…”
Section: Introductionmentioning
confidence: 92%