From plasma immersion ion implantation to deposition: a historical perspective on principles and trends

Abstract

Plasma immersion techniques of surface modification are known under a myriad of names.The family of techniques reaches from pure plasma ion implantation, to ion implantation and deposition hybrid modes, to modes that are essentially plasma film deposition with substrate bias.In the most general sense, all plasma immersion techniques have in common that the surface of a substrate (target) is exposed to plasma and that relatively high substrate bias is applied. The bias is usually pulsed. In this review, the roots of immersion techniques are explored, some going back to the 1800s, followed by a discussion of the groundbreaking works of Adler and Conrad in the 1980s. In the 1990s, plasma immersion techniques matured in theoretical understanding, scaling, and the range of applications. First commercial facilities are now operational. Various immersion concepts are compiled and explained in this review. While gas (often nitrogen) ion implantation dominated the early years, film-forming immersion techniques and semiconductor processing gained importance. In the 1980s and 1990s we have seen exponential growth of the field but signs of slowdown are clear since1998. Nevertheless, plasma immersion techniques have found, and will continue to have, an important place among surface modification techniques.

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

“…The PBII field acknowledged the development towards hybrid processes with deposition by explicitly including 'D' for deposition in the acronym PBII&D. More information on the early and intermediate history of the field has been published elsewhere [37,38], and much information can be found in the publications of the series of PBII (now PBII&D) workshops.…”

Cordões De Solda De Nióbio Tratados Termicamente via Implantação Iônica Por Imersão Em Plasma

“…A técnica consiste no bombardeamento de um material sólido com átomos ionizados de média e alta energia. Essa técnica oferece a possibilidade de se implantar, ou ligar, qualquer tipo de elemento nas regiões próximas da superfície do material [7], modificando as características mecânicas, físicas ou químicas na região superficial do material. A alteração nas propriedades do substrato se deve à transferência de energia dos íons para sua superfície e à diversidade de espécies químicas presentes no plasma [7].…”

“…Essa técnica oferece a possibilidade de se implantar, ou ligar, qualquer tipo de elemento nas regiões próximas da superfície do material [7], modificando as características mecânicas, físicas ou químicas na região superficial do material. A alteração nas propriedades do substrato se deve à transferência de energia dos íons para sua superfície e à diversidade de espécies químicas presentes no plasma [7]. No 3IP, o material a ser tratado é imerso no plasma, sendo submetido a pulsos negativos de média a alta tensão (tipicamente 5 kV a 50 kV), duração de 10 μs a 100 μs e taxa de repetição variando entre 10 Hz a 5 kHz [8].…”

Surface modification of biomaterials using plasma immersion ion implantation and deposition

“…Among the various plasmabased techniques, PIII&D is a versatile technique that can conduct multiple processes, such as simultaneous and consecutive implantation, deposition and etching owing to it combining the advantages of conventional plasma and ion beam technologies. Another major advantage of PIII&D is the omnidirectional processing capability to tailor the surface properties of many biomaterials, including metals, ceramics and polymers, by introducing a myriad of different kinds of elements and functional groups into the materials with complex shapes [24,25]. PIII&D technique is usually applied in areas such as microelectronics, aerospace engineering and precision manufacturing.…”