Abstract:This paper describes the use of a unique combination of an environmentally stable chemically amplified photoresist (UV113, Shipley) and a copolymer of methyl styrene and chloromethyl acrylate P(MS/CMA) resist (ZEP520, Zeon), without any additional intermediate layers, in the fabrication of micro-and nanochannels. The two resists used are innocuous to each other during the designed process flow, providing flexibility, high resolution, greater throughput and ease of use. We have also determined that the maximum … Show more
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