2011
DOI: 10.1088/0953-8984/23/50/505302
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From amorphous to crystalline silicon nanoclusters: structural effects on exciton properties

Abstract: Synchrotron x-ray absorption spectroscopy (XAS) and electron spin resonance (ESR) experiments were performed to determine, in combination with Raman spectroscopy and x-ray diffraction (XRD) data from previous reports, the structure and paramagnetic defect status of Si-nanoclusters (ncls) at various intermediate formation stages in Si-rich Si oxide films having different Si concentrations (y = 0.36-0.42 in Si y O 1−y ), fabricated by electron cyclotron resonance plasma-enhanced chemical vapor deposition and iso… Show more

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Cited by 7 publications
(13 citation statements)
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References 62 publications
(141 reference statements)
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“…For T a =900ºC, in contrast, for which the Si-ncls are amorphous, no dispersion is observed and the experimental data points cannot be well fit by the quantum confined exciton model. More effects showing the same trend have been reported in previous papers (2,3).…”
Section: Photoluminescencesupporting
confidence: 88%
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“…For T a =900ºC, in contrast, for which the Si-ncls are amorphous, no dispersion is observed and the experimental data points cannot be well fit by the quantum confined exciton model. More effects showing the same trend have been reported in previous papers (2,3).…”
Section: Photoluminescencesupporting
confidence: 88%
“…An analysis indicates that most of the excess silicon is already precipitated into amorphous nanoclusters in the as grown film (2). The strong chemical ordering tendency deduced by XRD after annealing at T a = 900 °C and 1100ºC is confirmed by the XAS data, as deduced by the reduced contributions from the mixed tetrahedra and the concomitant increase in the SiO 4 peak in the spectrum of Fig.…”
Section: Ecs Transactions 45 (5) 11-19 (2012)mentioning
confidence: 57%
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“…It was shown in the previous section that when x increases, the experimental ratio ν 0,0 /ν 0,2 approaches the value predicted by CFM. Now, it is well known that for higher Si content in the film, the crystallization process of Si-nc is enhanced [27,46]. In other words, the formation of Si-nc is always more efficient in the films with higher x.…”
Section: Discussionmentioning
confidence: 99%