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2014
DOI: 10.1063/1.4863832
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Friction force microscopy studies on SiO2 supported pristine and hydrogenated graphene

Abstract: A graphene sample supported on SiO2 with pristine and plasma-hydrogenated parts is investigated by friction force microscopy. An initial contrast in friction is apparent between the two regions. A tip induced cleaning of the surface in the course of continuous scanning results in a very clean surface accompanied with a reduction of the friction force by a factor of up to 4. The contamination is adhering stronger to hydrogenated regions, but once cleaned, the frictional behavior is the same on pristine and hydr… Show more

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Cited by 32 publications
(26 citation statements)
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“…For hydrogenated graphene, the friction force is three times higher than for pristine graphene [65]. However, based on in situ cleaning with an AFM tip, Fessler et al attributed this to surface contamination [71]. Once cleaned, the frictional behavior became the same as for pristine graphene.…”
Section: Figmentioning
confidence: 97%
“…For hydrogenated graphene, the friction force is three times higher than for pristine graphene [65]. However, based on in situ cleaning with an AFM tip, Fessler et al attributed this to surface contamination [71]. Once cleaned, the frictional behavior became the same as for pristine graphene.…”
Section: Figmentioning
confidence: 97%
“…The normal force was set to be 20 nN, referring to other groups. [20][21][22][23] A specic area was scanned several times with a rate of 0.2 Hz, and residue was mechanically pushed to the sides (Fig. 1).…”
Section: Afm Cleaningmentioning
confidence: 99%
“…8 Aer transfer, PMMA cannot be removed completely, and the residue of PMMA degrades intrinsic electric and optical properties of 2D materials. [9][10][11][12] To address this issue, solutions such as annealing, [13][14][15][16][17] chemicals, 14 current-induced 18,19 atomic force microscope (AFM) cleaning, [20][21][22][23] rubbing cloth to induce electrostatic force, 24 inductively coupled plasma, 25 stencil mask patterning, 26,27 andCO 2 cluster 28 are usually employed.…”
Section: Introductionmentioning
confidence: 99%
“…AFM based nanoindentation and force-distance measurements were 15 employed to study elastic properties of graphene [1,20,21,22] and van der Waals screening [10], while frictional properties [23,24,25,26,27,28] and friction and wear protection [7,29,30] were characterized using the lateral (friction) force microscopy. Strong mechanical interaction between AFM probe and graphene was employed for the graphene patterning based on either static (scratching) 20 [31,32] or dynamic plowing [33].…”
Section: Introductionmentioning
confidence: 99%