Fourier Transforms - New Analytical Approaches and FTIR Strategies 2011
DOI: 10.5772/14921
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Fourier Transform Photocurrent Spectroscopy on Non-Crystalline Semiconductors

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Cited by 11 publications
(10 citation statements)
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“…To obtain the absolute variations of α, the FTPS spectrum has to be calibrated from transmission/reflection measurements. For a review of the FTPS technique and its application to thin films, see, for instance, the work of Holovski …”
Section: Experimental Sectionmentioning
confidence: 99%
“…To obtain the absolute variations of α, the FTPS spectrum has to be calibrated from transmission/reflection measurements. For a review of the FTPS technique and its application to thin films, see, for instance, the work of Holovski …”
Section: Experimental Sectionmentioning
confidence: 99%
“…The cells areas were defined by using a shadow mask (0.126 cm 2 ). Fourier transform photocurrent spectroscopy (FTPS) [18] was used to determine the effect of the TCO substrate on the absorption coefficient (α) and defect density of pm-Si:H in the cells. Dark conductivity (σ d ) of p-type silicon oxide on Corning 7059 glass was measured using a coplanar Al electrode configuration.…”
Section: Methodsmentioning
confidence: 99%
“…Fourier transform photocurrent spectroscopy (FTPS) enables fast and highly sensitive measurements of photocurrent spectra over several orders of magnitude [49]. It can be used for the characterization of electrically active defects in silicon thin films [50], since it allows the determination of sub-band gap photocurrent features related to sub-band gap electronic states created by defects in the material.…”
Section: Methodsmentioning
confidence: 99%
“…It can be used for the characterization of electrically active defects in silicon thin films [50], since it allows the determination of sub-band gap photocurrent features related to sub-band gap electronic states created by defects in the material. The principle of this technique is described in [49] and [50]. Coplanar interdigitated aluminum contacts separated by 100 μm have been evaporated on top of uniformly doped (~10 16 cm − 3 ) 10 μm-thick, polycrystalline silicon layers.…”
Section: Methodsmentioning
confidence: 99%
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