“…Previously, CrN and Cr(N,O) thin films were synthesized by PLD 21,22) or RF reactive unbalanced magnetron sputtering [23][24][25] as hard coatings for cutting tools. Moreover, we have proposed the dissolution of third elements at the Cr sites of CrN and Cr(N,O) in order to improve the hardness of these films 26) and synthesized (Cr,Al)N, 27) Cr-Al-N-O, 28) (Cr,Mg)(N,O), 29) Cr-Zn-N-O, 30) and Cr-Si-N 31) thin films by PLD.…”