“…Other techniques previously used to grow PbTe thin films have included molecular beam epitaxy [21,22], chemical vapor deposition [23,24], pulsed laser deposition [25,26] and hot-wall epitaxy [15]. One of the major drawbacks of these techniques is the use of high temperatures for the growth of films which results in heatinduced interdiffusion [27] of elements in adjacent structure layers, which can degrade deposit quality.…”