2022
DOI: 10.1109/ted.2022.3191988
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Forming-Free NbO x -Based Memristor Enabling Low-Energy-Consumption Artificial Spiking Afferent Nerves

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Cited by 9 publications
(6 citation statements)
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“…The energy consumption was estimated by integrating the power over a period of time and dividing the resulting energy by the number of corresponding spikes. We derive a value of about 80 pJ/spike, which is comparable to the value found in other papers for NbO x devices [31,32]. In the future, reducing the external capacitance (here parasitic) could drastically reduce the energy consumption.…”
Section: Fabrication and Methodssupporting
confidence: 86%
“…The energy consumption was estimated by integrating the power over a period of time and dividing the resulting energy by the number of corresponding spikes. We derive a value of about 80 pJ/spike, which is comparable to the value found in other papers for NbO x devices [31,32]. In the future, reducing the external capacitance (here parasitic) could drastically reduce the energy consumption.…”
Section: Fabrication and Methodssupporting
confidence: 86%
“…The oscillatory neural network (ONN) is a neuromorphic computing architecture based on relaxation oscillators for the application of image segmentation and pattern recognition [3][4][5][6]. An ONN is modeled on the synchronous oscillatory behavior observed in biological brains, and the ONN circuit consists of oscillatory neurons and synaptic devices [7,8]. In an ONN, the relaxation oscillator acts as an oscillatory neuron that generates multiple pulses with the oscillating frequency and phase.…”
Section: Introductionmentioning
confidence: 99%
“…Materials exhibiting both RSs have been observed to depend on the bias voltage, thickness or a change in the electrode [ 13 , 14 , 15 , 16 ]. Transition metal oxides such as WO 3 , Nb 2 O 5 , TaO x and HfO x are the most common type of active materials in analog RS memristors [ 8 , 17 , 18 , 19 , 20 ]. Additionally, the combination of the advantages of resistive random-access memory and a ferroelectric field-effect transistor has been reported in Hf 0.5 Zr 0.5 O 2 films for its application to high-accuracy on-chip deep neural networks [ 21 ].…”
Section: Introductionmentioning
confidence: 99%