2012
DOI: 10.1016/j.tsf.2012.11.009
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Formation of α-approximant and quasicrystalline Al–Cu–Fe thin films

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Cited by 9 publications
(3 citation statements)
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“…XRD and GIWAXS Characterization : An in situ annealing XRD measurement was performed using a Philips X'Pert MPD Bragg‐Brentano diffractometer equipped with a Edmund‐Bühler HDK 2.4 high‐temperature high‐vacuum chamber with a Be window . The GIWAXS measurements were carried out at BL23A1 of National Synchrotron Radiation Research Center, Hsinchu.…”
Section: Methodsmentioning
confidence: 99%
“…XRD and GIWAXS Characterization : An in situ annealing XRD measurement was performed using a Philips X'Pert MPD Bragg‐Brentano diffractometer equipped with a Edmund‐Bühler HDK 2.4 high‐temperature high‐vacuum chamber with a Be window . The GIWAXS measurements were carried out at BL23A1 of National Synchrotron Radiation Research Center, Hsinchu.…”
Section: Methodsmentioning
confidence: 99%
“…It should be noted that the face-centered icosahedral quasicrystalline phase was detected through the whole milling process. The traces of the s 5 -Al 7.4 Fe 2 Si phase, one of a ternary s-type phases enriched in Fe and Si [46], has been observed in multilayered Al/Cu/Fe thin films deposited onto Si substrate in the Al-deficient samples, together with the dominating a-Al 55 Si 7 Cu 25.5-Fe 12.5 approximant [47].…”
Section: Discussionmentioning
confidence: 91%
“…Al-Cu-Fe-based quasicrystalline thin films show exceptional surface and mechanical properties. The direct growth of quasicrystals was reported in multilayer Al-Cu-Fe thin films after subsequent heat treatment [13]. Successful application of Al60Cu28Fe12 quasicrystalline and film coating obtained through three-electrode ionplasma sputtering of assembled targets was reported, and this coating contained a quasi-crystalline 𝑖-phase that was stable up to 723K [14].…”
Section: Introductionmentioning
confidence: 94%