2006
DOI: 10.1016/j.susc.2005.10.050
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Formation of vinylidene and vinylene by selective reactivity of Si(100)2×1 towards iso, cis and trans isomers of dichloroethylene

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Cited by 14 publications
(37 citation statements)
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“…The general trend for halogenated ethylenes does not hold up for di-and tetra-substituted ethylenes. In the studies of Zhou et al, dibromoethylene [82], cis-dichloroethylene [83], trans-dichloroethylene [329], isodichloroethylene [329] and perchloroethylene [83] all exhibited C-Halogen bond dissociation leading to a variety of products and complex thermal chemistry. Interestingly, whether a mono-σ -bonded or di-σ -bonded structures are formed, it seems that the C=C double bond is preserved remarkably well during the first step of a reaction with Si(100)-2×1.…”
Section: Simple Derivatives Of Ethylenementioning
confidence: 99%
“…The general trend for halogenated ethylenes does not hold up for di-and tetra-substituted ethylenes. In the studies of Zhou et al, dibromoethylene [82], cis-dichloroethylene [83], trans-dichloroethylene [329], isodichloroethylene [329] and perchloroethylene [83] all exhibited C-Halogen bond dissociation leading to a variety of products and complex thermal chemistry. Interestingly, whether a mono-σ -bonded or di-σ -bonded structures are formed, it seems that the C=C double bond is preserved remarkably well during the first step of a reaction with Si(100)-2×1.…”
Section: Simple Derivatives Of Ethylenementioning
confidence: 99%
“…Moreover, the adjacent Si dimer di-dechlorination mechanism results in a conversion process of mono-s to inter-dimer tetra-s. It can well rationalize the peaks shifting from Ca 1s (285.6 eV) to Cb 1s (283.9 eV) observed in the XPS experiment, 2 whereas the insertion mechanism fails to provide a plausible explanation.…”
Section: Introductionmentioning
confidence: 83%
“…Recent studies have revealed that DCE mainly undergoes the Cl dissociation process on the Si(100) and Si(111) surfaces, which differs from the wellknown cycloaddition reaction of alkene adsorption on silicon surfaces. [1][2][3][4][5][6][7] Two different dechlorination mechanisms have been proposed. The first one is the insertion mechanism proposed by Leung.…”
Section: Introductionmentioning
confidence: 99%
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“…We have recently conducted a series of studies involving bifunctional organic molecules on Si(100)2 × 1 surfaces. By comparing the reactivities of several common functional groups, including halogen atoms (Br, 16 Cl), 17 hydroxyl (OH), 18 carbonyl (C O), 18 carboxylic (COOH), 19 and more recently amino (NH 2 groups, 20 to a reference group such as the ethenyl group (C C), we obtain insights into factors that control their reactivities on the 2 × 1 dimer surface. In the present work, we give the first inter-comparison between two of these functional groups, particularly, the hydroxyl and amino groups, in a simple bifunctional molecule, ethanolamine (OH-CH 2 -CH 2 -NH 2 .…”
Section: Introductionmentioning
confidence: 99%