2011
DOI: 10.1166/mex.2011.1015
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Competitive Bonding of Amino and Hydroxyl Groups in Ethanolamine on Si(100)2×1: Temperature-Dependent X-Ray Photoemission and Thermal Desorption Studies of Nanochemistry of a Double-Chelating Agent

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Cited by 11 publications
(7 citation statements)
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“…The major difference in N 1s between the thermal reaction (Figure c) and UV photoionization (Figure d) was the emergence of the distinctive peaks for Si–N at 397.7 eV , and 400.1 eV , for the thermally reacted cyclopropylamine (Figure c). Radi et al described the behavior of ethanolamine thermally reacting with the silicon (100) surface and found that the Si–N bond also had a tendency to form Si–N–Si bridges. On the basis of this argument, we prudently fitted and assigned the peak centered at 399.1 eV as Si–N–Si bridging.…”
Section: Resultsmentioning
confidence: 99%
“…The major difference in N 1s between the thermal reaction (Figure c) and UV photoionization (Figure d) was the emergence of the distinctive peaks for Si–N at 397.7 eV , and 400.1 eV , for the thermally reacted cyclopropylamine (Figure c). Radi et al described the behavior of ethanolamine thermally reacting with the silicon (100) surface and found that the Si–N bond also had a tendency to form Si–N–Si bridges. On the basis of this argument, we prudently fitted and assigned the peak centered at 399.1 eV as Si–N–Si bridging.…”
Section: Resultsmentioning
confidence: 99%
“…On the other hand, thermal-based hydrosilylation is another alternative that works at higher temperature (150-200 • C) that may ensure that water within from solvent is kept minimal to reduce the chances of oxidation. Recent models of thermal reactions do suggest that the surface reaction to form a stable Si-C linkage can proceed at lower temperatures (<150 • C) as reported by Horrock et al [4] but at these lower temperatures, hydrogenated silicon surface can also be prone to nucleophilic reactions [5,6]. Of these, surface reaction between alcohol and hydrogenated Silicon (Si-H) was well established in literature and many other reports had shown the formation of stable Si-O-C linkage towards the surface [7][8][9][10].…”
Section: Introductionmentioning
confidence: 82%
“…Second, the trimethoxysilyl groups of SiBr initiators could be hydrolyzed into silicon hydroxyl groups in the coating preparation condition (pH 8.5) and then condensed with the PDA hydroxyl and amino groups, as well as the neighboring silicon hydroxyl groups. Third, the formation of Si–O–Si and Si–O–C linkages at the PDA/SiBr coating interface was supported by the broadening of the XPS high-resolution spectrum of Si 2p (Figure S3A), since the SiBr-self-cross-linked Si–O–Si bond shows a narrow peak of Si 2p at 102.5 eV. Moreover, the appearance of the N 1s new peak (N–Si) at 398 eV (Figure S3B) suggests that the silicon hydroxyl also reacted with the amino group of the PDA forming an additional cross-linking bond (N–Si) at the interface of PDA/SiBr coating . Thus, the cross-linked PDA/SiBr coating enables the formation of stable PMPC brushes.…”
Section: Resultsmentioning
confidence: 98%
“…Moreover, the appearance of the N 1s new peak (N−Si) at 398 eV (Figure S3B) suggests that the silicon hydroxyl also reacted with the amino group of the PDA forming an additional crosslinking bond (N−Si) at the interface of PDA/SiBr coating. 46 Thus, the cross-linked PDA/SiBr coating enables the formation of stable PMPC brushes.…”
Section: ■ Results and Discussionmentioning
confidence: 99%