Formation of Ultrathin Polystyrene Films Using a Two-Step Deposition/Polymerization Process

Abstract

Thin polystyrene films were formed on polycrystalline platinum by styrene deposition followed by UV-initiated polymerization under cryogenic, ultrahigh-vacuum conditions. Temperature-programmed desorption (TPD) experiments showed that styrene chemisorbs weakly on the Pt surface. In the temperature region of 115−145 K, the adsorbed styrene films undergo a crystallization process that can be described by the Avrami equation. The polymerization rate increased with incident UV intensity, as expected, but was found to decrease with increasing temperature, most likely the result of competition between crystallization and polymerization. Ex-situ analysis of the resulting polystyrene films showed that high molecular weight polymer is formed. Finally, it is shown that the thickness can be reproducibly controlled by controlling the initial monomer dosage.

Study of the growth process of in situ polyaniline deposited films

“…The experimental results [33][34][35][36] were fitted using the Johnson-Mehl-Avrami equation (JMA), given by…”

A simple synthesis of mesoporous carbons with tunable mesopores using a colloidal template-mediated vapor deposition polymerization

“…Recently, our group reported that the vapor deposition polymerization (VDP) technique allows a simple route for the synthesis of inorganic-polymer and inorganic-carbon core-shell nanostructures by consecutive polymerization of vaporized monomer under vacuum onto the desired surface. 8 So far, VDP has been mainly performed to fabricate various thin films and core-shell nanostructures, 9 whereas considerably less attention has been paid to the application of VDP in colloidal templating. The VDP process makes it possible for monomer vapor to be polymerized even inside very small void spaces between colloidal particles without disrupting the characteristic of the colloidal template structure.…”

Fabrication and characterization of poly(triazine dithiol) thin films using a two-step deposition/ photopolymerization process and micropattern

“…[1][2][3][4][5][6] Many advanced applications of ultrathin polymer films can be envisioned, such as all polymeric semiconducting devices and direct-write lithography [5,6]. Currently, the most common method to prepare thin polymer films is by wet techniques, such as electrochemical deposition, spin coating.…”

“…The characterizations of the films were carried out using ex-situ Fourier transformationinfrared-reflection absorption spectroscopy (FT-IR-RAS), X-ray photoelectron spectroscopy (XPS), optical microscopy and atomic force microscopy (AFM). Figure 1 shows FT-IR-RAS spectra of 6-diallylamino- [1,3,5]triazine-2,4-dithiol (DA) thin films of 50 nm UV irritated at various times. Table 1 summarizes the main absorption bands found in the spectra and their associated vibration modes.…”