Formation of Transition Metal Nitrides by Rapid Thermal Processing (RTP)

V(5)Al(8) and V(3)Al intermetallics have been formed by interdiffusion, by annealing of sputtered V/Al-multilayers at 700 degrees C in vacuo; sapphire (102) was used as substrate. The V/Al intermetallics were nitridated in NH(3) at 900 degrees C for 1 min by RTP (rapid thermal processing). The samples were investigated with XRD (X-ray diffraction), SNMS (secondary neutral mass spectrometry), and AFM (atomic force microscopy). A 5-10 nm thick AlN film (001 textured) was formed by nitridation of V(5)Al(8) (110 textured) and 2-3% nitrogen was incorporated in the V(5)Al(8) bulk. Nitridation of V(3)Al resulted in the formation of VN and AlN. Direct nitridation of V/Al-multilayers showed that near the surface nitridation is faster than intermixing of the V and Al layers. The capability of VN as diffusion barrier for Al could also be shown.

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“…RTP uses a special furnace equipped with tungsten halogen lamps to perform rapid processes. Experimental details are given elsewhere [14].…”

Section: Methodsmentioning

confidence: 99%

Formation and nitridation of vanadium-aluminum intermetallic compounds

Lewalter

Böck

Kolbesen

2002

Analytical and Bioanalytical Chemistry

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“…Osbornite, a nitride, is chemically robust and appears not to have (completely) decomposed or dissolved in later-forming minerals. Experiments involving annealing of Ti/V multilayers in a conventional furnace with nitriding gases have shown that interdiffusion and homogenization of Ti and V nitride layers occur at temperatures as low as 1100 K (Galesic et al, 2000) in terrestrial laboratory conditions. The relevant homogenization temperature under the conditions of formation for Inti osbornite is unknown.…”

Section: Comparison Of Inti Osbornite With Meteoritic Occurrencesmentioning

confidence: 99%

The origin of refractory minerals in comet 81P/Wild 2

Chi¹,

Ishii²,

Simon³

et al. 2009

Geochimica et Cosmochimica Acta

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Refractory Ti-bearing minerals in the calcium-, aluminum-rich inclusion (CAI) Inti, recovered from the comet 81P/Wild 2 sample, were examined using analytical (scanning) transmission electron microscopy (STEM) methods including imaging, nanodiffraction, energy-dispersive spectroscopy (EDX) and electron energy loss spectroscopy (EELS). Inti fassaite (Ca(Mg,Ti,Al) (Si,Al) 2 O 6 ) was found to have a Ti 3+ /Ti 4+ ratio of 2.0 ± 0.2, consistent with fassaite in other solar system CAIs. The oxygen fugacity (log f O 2 ) of formation estimated from this ratio, assuming equilibration among phases at 1509 K, is À19.4 ± 1.3. This value is near the canonical solar nebula value (À18.1 ± 0.3) and in close agreement with that reported for fassaite-bearing Allende CAIs (À19.8 ± 0.9) by other researchers using the same assumptions. Nanocrystals of osbornite (Ti(V)N), 2-40 nm in diameter, are embedded as inclusions within gehlenite, spinel and diopside in Inti. Vanadium is heterogeneously distributed within some osbornite crystals. Compositions range from pure TiN to Ti 0.36 V 0.64 N. The possible presence of oxide and carbide in solid solution with the osbornite was evaluated. The osbornite may contain O, but C is not present at detectable levels. The presence of osbornite, likely a refractory early condensate, together with the other refractory minerals in Inti, indicates that the parent comet contains solids that condensed closer to the proto-sun than the distance at which the parent comet itself accreted. The estimated oxygen fugacity and the reported isotopic and chemical compositions are consistent with Inti originating in the inner solar system like other meteoritic CAIs. These results provide insight for evaluating the validity of models of radial mass transport dynamics in the early solar system. The oxidation environments inferred for the Inti mineral assemblage are inconsistent with an X-wind formation scenario. In contrast, radial mixing models that allow accretion of components from different heliocentric distances can satisfy the observations from the cometary CAI Inti.

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“…-Tras la implantación de 1.25x10 17 N + /cm 2 , el diagrama de difracción correspondiente no muestra la aparición de nuevas fases, como predecían las consideraciones termodinámicas. Se observa simplemente un corrimiento hacia ángulos más pequeños debido a la deformación de la red por la incorporación de nitrógeno en la matriz de niobio, en concordancia con otros trabajos (23). Para las muestras implantadas con 3.5 x10…”

Section: 2xrd Con áNgulo Rasanteunclassified

Estudio por GXRD de la formación de fases en metales de los grupos IV y V por implantación iónica de nitrógeno

Garcı́a¹,

Rius²,

Rodríguez³

2004

Bol. Soc. Esp. Ceram. Vidr.

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La implantación iónica de altas dosis de nitrógeno produce cambios significativos en la composición y estructura de las capas más externas de los materiales tratados. Estos cambios se reflejan en la modificación de las propiedades mecánicas superficiales, pudiendo conseguirse aumentos importantes de dureza y resistencia al desgaste. En el presente trabajo se presenta un resumen de los cambios en las propiedades mecánicas superficiales producidos por la implantación iónica de nitrógeno en los distintos metales de los grupos IV (Ti, Zr, Hf) y V (V, Nb, Ta), intentándose relacionar dichos cambios con las distintas fases formadas estudiadas mediante técnicas de difracción de rayos X con ángulo rasante (GXRD). La caracterización por GXRD pone de manifiesto el papel del nitrógeno como responsable de los cambios en la microdureza y de las propiedades tribológicas observadas. Palabras clave: Implantación iónica, GXRD, Dureza, Tribología GXRD study of phase formation in metals of IV and V groups ion implanted with nitrogenHigh doses of nitrogen ion implantation introduce important modifications in the composition and microstructure of the most outer surface of the treated materials. Owing to this modifications, treated materials increase dramatically hardness and wear resistance. In this paper the changes in hardness and in the tribological properties of the groups IV and V are summarized. Special emphasis is given to the relationships between these improvements and the results obtained from GXRD analysis. Moreover GXRD results are showing the role of nitrogen in the improvements of hardness and the tribological properties. Keywords: Ion implantation, GXRD, Hardness, Tribology IntRoDuccIónLos metales y aleaciones de los grupos IV y V (titanio, circonio, hafnio, vanadio, tantalo y tungsteno) son ampliamente utilizados en distintas aplicaciones industriales. Por ejemplo, el titanio y sus aleaciones son empleadas ampliamente en el sector aeroespacial y biomédico, el circonio y el vanadio en aplicaciones nucleares (1,2), y el tántalo y el tungsteno en aplicaciones que requieran resistencia a elevadas temperaturas. Aunque estos materiales poseen en general buenas propiedades de resistencia mecánica, ofrecen unas pobres propiedades tribológicas, sufriendo altos grados de desgaste y un rápido deterioro superficial. Recientemente se han publicado estudios sistemáticos que recogen las mejoras que produce la implantación ionica de nitrógeno en estos materiales, apuntando a la precipitación de nitruros como el principal responsable de estas mejoras (3,5). En este artículo se resumen y comentan los efectos y las modificaciones producidos por la implantación de distintas dosis de nitrógeno atómico y molecular sobre los metales de los grupos IV y V, tratando de relacionar los cambios en las propiedades tribológicas con la precipitación de las distintas fases caracterizadas por GXRD. Detalles eXpeRImentales. materiales y preparación.Se prepararon probetas de Titanio de 30 mm de diámetro a partir de barras de Ti GR.2 recocido. El resto ...

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Formation of Transition Metal Nitrides by Rapid Thermal Processing (RTP)

Cited by 9 publications

References 5 publications

Formation and nitridation of vanadium-aluminum intermetallic compounds

Formation and nitridation of vanadium-aluminum intermetallic compounds

The origin of refractory minerals in comet 81P/Wild 2

Estudio por GXRD de la formación de fases en metales de los grupos IV y V por implantación iónica de nitrógeno

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