Formation of self‐assembled metal/silicon nanocomposites

Granitzer, Petra; Rumpf, Klemens; Pölt, Peter; Simic, Sanja; Krenn, H.

doi:10.1002/pssa.200778114

Cited by 21 publications

(28 citation statements)

References 13 publications

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“…The samples exhibit a statistically distributed 3-dimensional array of precipitated metal-nanostructures. The distribution can be influenced by the electrochemical process parameters [7]. So at a certain cross-sectional level not all the pores are filled with metal-structures.…”

Section: Resultsmentioning

confidence: 99%

“…The pulsed technique with frequencies between 0.025 Hz and 0.2 Hz is utilized to avoid the exhaustion of the electrolyte within the pores which is important because the metal deposition within such high aspect ratio pores is affected by mass transfer and is a diffusion limited process. As electrolyte an aqueous metal-salt solution is used whereas as buffer boric acid is added [7]. In case of Ni-deposition a NiCl 2 -electrolyte or the so called Watts electrolyte (NiCl 2 , NiSO 4 ) are used.…”

Section: Experimental 21 Fabrication Of the Silicon/metal Compositementioning

confidence: 99%

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The interior interfaces of a semiconductor/metal nanocomposite and their influence on its physical properties

Granitzer

Rumpf

Poelt

et al. 2009

Phys. Status Solidi (c)

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A semiconductor/metal hybrid system with silicon as base material and embedded metal nanostructures is fabricated in two steps by anodizing the silicon substrate in an aqueous hydrofluoric acid solution and a subsequent electrodeposition process. The achieved self‐assembled nanoscopic hybrid system consists of a quasi‐regular 3‐dimensional arrangement of metal nanostructures embedded within the pores of the silicon matrix. The used metals are Ni, Co and their alloys, whereas mainly Ni is considered in the following. In such a hybrid system the interface between metal and silicon nanostructures is of interest in correlation with the properties of the material and can be influenced by different fabrication conditions. If the matrices are aged in ambient air before filling with a metal the inner surface of the porous silicon template offers a native SiOx layer due to the oxidation of the hydrogen terminated surface of the pore‐walls. Using as‐etched samples for deposition of the metal into the pores leads to the formation of a more complex interface during the cathodic deposition procedure which is observed by FTIR‐spectroscopy. Knowledge about the composition and the formation of the interior surface of the porous silicon matrix as well as the interface between semiconductor and metal is necessary on the one hand for interpretation of the gained experimental results and on the other hand to figure out possible applications of the fabricated hybrid system. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Section: Resultsmentioning

confidence: 99%

Section: Experimental 21 Fabrication Of the Silicon/metal Compositementioning

confidence: 99%

The interior interfaces of a semiconductor/metal nanocomposite and their influence on its physical properties

Granitzer

Rumpf

Poelt

et al. 2009

Phys. Status Solidi (c)

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“…In a subsequent procedure within the pores of the two layers one or two different metals are deposited. The precipitated metal nanostructures are distributed within each pore in such a way that they dipolarly couple which has been discussed in a previous work (17). …”

Section: Discussionmentioning

confidence: 96%

Double-Sided Mesoporous Silicon with Embedded Quasi-Regular Arranged Ferromagnetic Nanostructures Fabricated by Electrodeposition

Granitzer

Rumpf²,

Albu

et al. 2010

ECS Trans.

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Porous silicon matrices fabricated by wet etching are used as template for the deposition of metal nanostructures. The anodization of the silicon wafer is performed on one or on both sides in employing a double-tank electrolytic cell. The resulting porous layers are subsequently filled with a ferromagnetic metal by electrodeposition. In case of double-sided samples an alternating pulsed current is applied. These two processes are extended to ultrathin samples with an entire thickness of about 60 µm. The morphology of the porous structure exhibits average porediameters of 60 nm, a mean pore-spacing of 45 nm and a porelength of 40 µm. Ferromagnetic metals are electrochemically deposited as nanostructures with a specific distribution within the pores.

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“…In a further electrochemical step the templates are filled with Ni or Co. The deposition is performed in using a Ni-/Co-salt solution as electrolyte and applying pulsed deposition technique to avoid the exhaustion of the electrolyte [7]. In a previous publication the dependence of the geometry as well as of the spatial distribution of the precipitations on the electrochemical parameters is presented [8].…”

Section: Methodsmentioning

confidence: 99%

Temperature dependence of a twofold magnetic behaviour of a nanoscopic metal/silicon hybrid system – a comparison between Ni/Si and Co/Si

Rumpf¹,

Granitzer²,

Poelt³

et al. 2009

Phys. Status Solidi (c)

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The investigated hybrid nanocomposite consists of a porous silicon template with electrochemically embedded Ni or Co nanostructures and offers magnetic characteristics which can be tailored by the electrochemical process parameters during fabrication. A twofold magnetic behaviour can be observed, a first one due to the spinmagnetism at magnetic fields below the saturation magnetization of the deposited metals and a second non‐saturating term at higher fields (> 1 T up to 7 T) above the saturation magnetization. In case of Ni deposited within the pores this non‐saturating term shows a paramagnetic characteristic and follows exactly the Curie‐Weiss law, whereas for Co/porous silicon samples the temperature dependent magnetization shows some deviations from the Curie Weiss law. In this high field region a difference in the temperature dependence between Ni and Co is observed whereas the non‐saturating term does not depend on the geometry of the embedded nanostructures in contrast to the ferromagnetic behaviour at lower magnetic fields. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Formation of self‐assembled metal/silicon nanocomposites

Cited by 21 publications

References 13 publications

The interior interfaces of a semiconductor/metal nanocomposite and their influence on its physical properties

The interior interfaces of a semiconductor/metal nanocomposite and their influence on its physical properties

Double-Sided Mesoporous Silicon with Embedded Quasi-Regular Arranged Ferromagnetic Nanostructures Fabricated by Electrodeposition

Temperature dependence of a twofold magnetic behaviour of a nanoscopic metal/silicon hybrid system – a comparison between Ni/Si and Co/Si

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