2009
DOI: 10.4028/www.scientific.net/msf.628-629.405
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Formation of PZT Thick Film Single Elements Using EHDA Deposition

Abstract: In this paper, electrohydrodynamic atomization combined with a polymeric micromoulding technique was used to form PZT single element devices using a PZT sol-gel slurry without an etching process. The PZT single element device was initially designed to work as a piezoelectric ultrasonic transducer consisting of a circular or a square of various sizes, which was produced and used to evaluate the process. The resulting PZT device had a homogenous microstructure. It was observed that the relative permittivity of t… Show more

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Cited by 2 publications
(1 citation statement)
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“…Therefore, in this work, the atomization distance for the Pt/C-C layer deposition (7 mm) is higher than that for the C and Pt/C layer deposition (3 mm). The higher working distance can produce more porous structure [17]. The same atomization conditions were applied on the anode side and the structure characteristics were similar to the cathode side, that is more porous Pt-Ru/C-C layer compared with the C and Pt-Ru/C layer (Fig.…”
Section: Formation Of Catalyst-diffusion Layermentioning
confidence: 97%
“…Therefore, in this work, the atomization distance for the Pt/C-C layer deposition (7 mm) is higher than that for the C and Pt/C layer deposition (3 mm). The higher working distance can produce more porous structure [17]. The same atomization conditions were applied on the anode side and the structure characteristics were similar to the cathode side, that is more porous Pt-Ru/C-C layer compared with the C and Pt-Ru/C layer (Fig.…”
Section: Formation Of Catalyst-diffusion Layermentioning
confidence: 97%