2011
DOI: 10.4028/www.scientific.net/msf.679-680.437
|View full text |Cite
|
Sign up to set email alerts
|

Formation of Periodic Steps on 6H-SiC (0001) Surface by Annealing in a High Vacuum

Abstract: Influence of high-vacuum annealing at temperatures in the range 1300-1400°C and residual pressure of ~10-6 Torr on the surface of 6H-SiC (0001) wafers has been studied. Auger spectroscopy and RHEED data show that the annealing conditions do not lead to any surface reconstruction of the wafers. Atomic force microscopy reveals atomically flat surface terraces separated by steps of unit-cell height (h = 1.5 nm).

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
9
0
1

Year Published

2015
2015
2023
2023

Publication Types

Select...
6
2

Relationship

0
8

Authors

Journals

citations
Cited by 16 publications
(10 citation statements)
references
References 5 publications
0
9
0
1
Order By: Relevance
“…Commercial, mechanically polished SiC wafers are often damaged and show a high density of scratches in AFM (Figure 43a). Hydrogen etching [153][154][155][156][157], thermal etching [158][159][160][161], and tetrafluorosilane (SiF4) etching [162] are known to improve this situation by removing several hundred nanometers of bulk material. Here we present some hydrogen etching studies.…”
Section: Substrate Preparation By Etchingmentioning
confidence: 99%
“…Commercial, mechanically polished SiC wafers are often damaged and show a high density of scratches in AFM (Figure 43a). Hydrogen etching [153][154][155][156][157], thermal etching [158][159][160][161], and tetrafluorosilane (SiF4) etching [162] are known to improve this situation by removing several hundred nanometers of bulk material. Here we present some hydrogen etching studies.…”
Section: Substrate Preparation By Etchingmentioning
confidence: 99%
“…The graphene film was grown on n-type 6H-SiC (0001) silicon carbide substrate by sublimation method with an original pre-growth treatment essentially enhancing the film quality [13,14,16]. The growth was performed on nominally on-axis 6H-SiC wafers with polished Si (0001) face purchased from Cree Corp.…”
mentioning
confidence: 99%
“…The growth was performed on nominally on-axis 6H-SiC wafers with polished Si (0001) face purchased from Cree Corp. The high-vacuum annealing of SiC wafers before graphene growth was used for removing distorted surface layer caused by mechanical polishing [16]. The graphene film formations was carried out in inductively heated furnace at temperature of 2000 o C and at an ambient argon pressure of 1 atm.…”
mentioning
confidence: 99%
“…In particular, the bilayer character of the film was confirmed by low energy electron diffraction experiments, as well as by the 0.2 eV shift of the spectrum due to the charge transfer to the substrate, which is typical for bilayer films [27][28][29]. Considering the bilayer as a quantum well with a SiC bandgap wall, one can assume that the van Hove singularities appear in the density of states because of the quantum confinement in the normal direction.…”
Section: Analysis Of the Films Obtainedmentioning
confidence: 85%