2012
DOI: 10.1007/s00339-012-7440-2
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Formation of iron and iron silicides on silicon and iron surfaces. Role of the deposition rate and volumetric effects

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Cited by 9 publications
(18 citation statements)
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“…In this brief observe, we summarize our recent results on this item and draw attention to the possibility to modify the film formation processes by using an intermediate layer of amorphous silicon on the substrate surface [1][2][3]. In our opinion, the advantages of this method are as follows.…”
Section: Contributed Articlementioning
confidence: 99%
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“…In this brief observe, we summarize our recent results on this item and draw attention to the possibility to modify the film formation processes by using an intermediate layer of amorphous silicon on the substrate surface [1][2][3]. In our opinion, the advantages of this method are as follows.…”
Section: Contributed Articlementioning
confidence: 99%
“…4. Due to deeper intermixing, formation of supercritical nuclei of silicides can take place deep under the surface where, due to volumetric effects, very high internal strains (of the order of a few GPa) can develop (see [3] for details). This promises creation of new silicide phases which do not form under normal conditions.…”
Section: Contributed Articlementioning
confidence: 99%
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“…In the processes of intermixing and silicide formation, volumetric effects are involved [12]. These effects originate from the difference in the volume per atom values, which are specific for each set of reagents and the product.…”
Section: Introductionmentioning
confidence: 99%