Formation of carbon nanoparticle using Ar+CH<sub>4</sub>high pressure nanosecond discharges

Koga, Kazunori; Dong, Xiao; Iwashita, Shinya; Czarnetzki, Uwe; Shiratani, Masaharu

doi:10.1088/1742-6596/518/1/012020

Cited by 5 publications

(2 citation statements)

References 36 publications

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“…The unique optical, electronic and mechanical properties of these materials are very attractive for a variety of potential applications [1][2][3][4][5]; therefore efficient pathways for production and modification of the nanomaterials are highly sought for. Synthesis of nanomaterials, referred below to as nanosynthesis, facilitated by plasma sources has become a staple technique for nanomaterial production [6][7][8]. Some nanomaterials can only be synthesized with plasma and for some, plasma approach is favored due to industrial scale yield, better selectivity and improved material characteristics [9].…”

Section: Introductionmentioning

confidence: 99%

Synthesis of nanoparticles in carbon arc: measurements and modeling

et al. 2018

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This work studies the region of nanoparticle growth in atmospheric pressure carbon arc.Detection of the nanoparticles is realized via the planar laser induced incandescence (PLII) approach.Measurements revealed large clouds of nanoparticles in the arc periphery, bordering the region with high density of diatomic carbon molecules. Two-dimensional computational fluid dynamic simulations of the arc combined with thermodynamic modeling explain these results due to interplay of the condensation of carbon molecular species and the convection flow pattern. The results have shown that the nanoparticles are formed in the colder, outside regions of the arc and described the parameters necessary for coagulation.

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Section: Introductionmentioning

confidence: 99%

Synthesis of nanoparticles in carbon arc: measurements and modeling

et al. 2018

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“…To obtain higher deposition rate, the non-trench Si substrate on which films deposited was set on a stainless steel step of 20 mm in height [22,23]. The substrate temperature was 100 °C.…”

Section: Experimental Methodsmentioning

confidence: 99%

Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method

Dong

Koga

Yamashita

et al. 2015

Trans. Mat. Res. Soc. Japan

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Hydrogen bonding configurations and hydrogen content of a-C:H films deposited by H-assisted plasma CVD were investigated by Fourier transform infrared spectroscopy. Plasma parameters related to deposition rate were derived using optical emission spectroscopy. The a-C:H films contain a large number of sp 3 configurations (93%) and a few sp 2 configurations (7%). Most of the hydrogen is bonded in methyl groups which shows the structure of deposited a-C:H films is polymer-like carbon. The mass density has nearly linear decreases with increasing the hydrogen atom density, indicating that control of hydrogen content is crucial to obtain a-C:H films of high mass density. A slight increase in radical generation rate and significant increases in etching rate by hydrogen atoms lead to decrease the deposition rate when the discharge voltage increases from 170 V to 180 V.

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The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

et al. 2018

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Formation of carbon nanoparticle using Ar+CH₄high pressure nanosecond discharges

Cited by 5 publications

References 36 publications

Synthesis of nanoparticles in carbon arc: measurements and modeling

Synthesis of nanoparticles in carbon arc: measurements and modeling

Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method

The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

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Formation of carbon nanoparticle using Ar+CH4high pressure nanosecond discharges

Cited by 5 publications

References 36 publications

Synthesis of nanoparticles in carbon arc: measurements and modeling

Synthesis of nanoparticles in carbon arc: measurements and modeling

Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method

The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

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Formation of carbon nanoparticle using Ar+CH₄high pressure nanosecond discharges

The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition