2020
DOI: 10.3390/ma13122871
|View full text |Cite
|
Sign up to set email alerts
|

Focused Ion Beam Milling of Single-Crystal Sapphire with A-, C-, and M-Orientations

Abstract: Sapphire substrates with different crystal orientations are widely used in optoelectronic applications. In this work, focused ion beam (FIB) milling of single-crystal sapphire with A-, C-, and M-orientations was performed. The material removal rate (MRR) and surface roughness (Sa) of sapphire with the three crystal orientations after FIB etching were derived. The experimental results show that: The MRR of A-plane sapphire is slightly higher than that of C-plane and M-plane sapphires; the Sa of A-plane sapphire… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
13
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 17 publications
(13 citation statements)
references
References 24 publications
0
13
0
Order By: Relevance
“…In a perfect crystal, the plane of chipping must pass between these nets. In the basal plane with interchanging O-Al-Al-O-Al-O layers, there are no conditions for cleavage, whereas in the plane (10)(11)…”
Section: Sample Preparation and Orientationmentioning
confidence: 99%
See 4 more Smart Citations
“…In a perfect crystal, the plane of chipping must pass between these nets. In the basal plane with interchanging O-Al-Al-O-Al-O layers, there are no conditions for cleavage, whereas in the plane (10)(11)…”
Section: Sample Preparation and Orientationmentioning
confidence: 99%
“…where M is the crystal orientation of (10-10), C is the crystal orientation of (0001), and A is the crystal orientation of (11)(12)(13)(14)(15)(16)(17)(18)(19)(20).…”
Section: Test Groupsmentioning
confidence: 99%
See 3 more Smart Citations