2005
DOI: 10.1016/j.mee.2004.12.006
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Focused ion beam lithography for two dimensional array structures for photonic applications

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Cited by 66 publications
(32 citation statements)
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“…[38][39][40], and 1D-and 2D-periodic arrays of nanoparticles, including arrays of nanospheres. [41][42][43][44][45][46][47][48][49][50][51][52] FIB is capable of forming patterns with ~10 nm resolution. 3 However, this technique can be rather slow in the fabrication process of large pattern areas (as for EBL, only small areas of the order of about 10 4 µm 2 can be fabricated with a reasonable cost).…”
Section: Focused Ion Beam Lithographymentioning
confidence: 99%
“…[38][39][40], and 1D-and 2D-periodic arrays of nanoparticles, including arrays of nanospheres. [41][42][43][44][45][46][47][48][49][50][51][52] FIB is capable of forming patterns with ~10 nm resolution. 3 However, this technique can be rather slow in the fabrication process of large pattern areas (as for EBL, only small areas of the order of about 10 4 µm 2 can be fabricated with a reasonable cost).…”
Section: Focused Ion Beam Lithographymentioning
confidence: 99%
“…Nowadays, besides their natural application as filters in particular under full band gap conditions, PhCs see a number of applications: optical fibers (Birks et al, 1997;Zhao et al, 2010), vertical cavity surface emitting lasers (Yokouchi et al, 2003), high reflection coatings, temperature sensors (Song et al, 2006), high efficiency solar cells (Bermel et al, 2007), electric field detectors (Song & Proietti Zaccaria, 2007), non-linear analysis (Malvezzi et al, 2002;Malvezzi et al, 2003), just to name a few. Many are the techniques for the fabrication of PhCs, for example by means of focused-ion beam (Cabrini et al, 2005), two-photon fabrication (Deubel et al, 2004), laser-interference (Proietti Zaccaria et al, 2008a) or waver-fusion techniques (Takahashi et al, 2006). Here we shall focus on the role that PhCs can play for another exciting discipline known as Plasmonics.…”
Section: Introductionmentioning
confidence: 99%
“…PhC structures for integrated optics and optoelectronics can be fabricated by different lithography techniques as interference lithography [1][2][3][4][5][6] , ion and electron beam lithography 7,8 , nanoimprint lithography [9][10][11] , and near-field scanning optical microscope lithography [12][13][14][15][16] . Optical techniques presented in this paper allow maskless definition of planar microstructures.…”
Section: Introductionmentioning
confidence: 99%