“…͓DOI: 10.1063/1.3075061͔ Patterned magnetic nanostructures with perpendicular anisotropy have potential applications in a host of emerging technologies, such as bit patterned media, 1,2 percolated perpendicular media, 3 spintronics, 4 magnetic random access memory, 5 and magnetic sensors. 6 To realize the full potential of these technologies, there are still key issues to be addressed such as the following: ͑1͒ simple and cost-effective fabrication process to achieve magnetic nanostructures over large areas and ͑2͒ understanding and control of magnetization reversal process in elements whose sizes are approaching the ferromagnetic exchange length. Among the many efforts to fabricate patterned magnetic nanostructures, a simple way is to deposit materials on prepatterned substrates [1][2][3]7 that, e.g., have been prepared by electron-beam lithography, 1,2 nanoimprint lithography, 8 extreme ultraviolet lithography, 7 and diblock copolymer templates.…”