2005
DOI: 10.1063/1.1853518
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Focused-ion-beam-fabricated nanoscale magnetoresistive ballistic sensors

Abstract: Articles you may be interested inTowards sub-200nm nano-structuring of linear giant magneto-resistive spin valves by a direct focused ion beam milling process J. Appl. Phys. 115, 064307 (2014); 10.1063/1.4865736 Concepts and steps for the realization of a new domain wall based giant magnetoresistance nanowire device: From the available 24 multiturn counter to a 212 turn counter

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Cited by 35 publications
(18 citation statements)
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“…There are a pair of unpublished reports by Mukherjee et al where a 20 per cent effect in a FIB cut 40 × 10 × 10 nm 3 Ni 80 Fe 20 junction is claimed [390], and atomic scale modelling of the magnetic configuration of such a structure is described [391]. A report of an MR of 18 per cent in a similar 35 nm device was published recently [392]. Ni nanocontacts were prepared by Ohsawa using a combination of FIB patterning followed by ion milling combined with in situ magnetoresistance measurements [393].…”
Section: Experimental Explorationmentioning
confidence: 98%
“…There are a pair of unpublished reports by Mukherjee et al where a 20 per cent effect in a FIB cut 40 × 10 × 10 nm 3 Ni 80 Fe 20 junction is claimed [390], and atomic scale modelling of the magnetic configuration of such a structure is described [391]. A report of an MR of 18 per cent in a similar 35 nm device was published recently [392]. Ni nanocontacts were prepared by Ohsawa using a combination of FIB patterning followed by ion milling combined with in situ magnetoresistance measurements [393].…”
Section: Experimental Explorationmentioning
confidence: 98%
“…͓DOI: 10.1063/1.3075061͔ Patterned magnetic nanostructures with perpendicular anisotropy have potential applications in a host of emerging technologies, such as bit patterned media, 1,2 percolated perpendicular media, 3 spintronics, 4 magnetic random access memory, 5 and magnetic sensors. 6 To realize the full potential of these technologies, there are still key issues to be addressed such as the following: ͑1͒ simple and cost-effective fabrication process to achieve magnetic nanostructures over large areas and ͑2͒ understanding and control of magnetization reversal process in elements whose sizes are approaching the ferromagnetic exchange length. Among the many efforts to fabricate patterned magnetic nanostructures, a simple way is to deposit materials on prepatterned substrates [1][2][3]7 that, e.g., have been prepared by electron-beam lithography, 1,2 nanoimprint lithography, 8 extreme ultraviolet lithography, 7 and diblock copolymer templates.…”
mentioning
confidence: 99%
“…Ebels et al 15 as well as Khizroev et al 16 and Lepedatu and Xu 5 have measured the extra electrical resistance R dw caused by a wall, in nanowires. The Ebels cobalt sample had a circular cross section with t = w as the diameter.…”
Section: Introductionmentioning
confidence: 99%