Focused Ion Beam Direct Fabrication of Subwavelength Nanostructures on Silicon for Multicolor Generation

Garg, Vivek; Mote, Rakesh G.; Fu, Jianzhong

doi:10.1002/admt.201800100

Cited by 23 publications

(15 citation statements)

References 27 publications

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“…Thus, the mechanism for the formation of polygonal nanoholes can be summarized in three stages as seen in Figure 1b: i) initial circular nanoholes with low dose irradiation due to milling process as melt-pool zones are far apart and do not interact with each other, ii) with an increase in the dose the size of the nanoholes increases and melt-pool zones of neighboring nanoholes start interacting with each other, iii) on the further increase in the dose the walls between adjoining nanoholes strengthens due to the viscous-fingering phenomenon, and periodic polygonal nanoholes are formed. In contrast to the common sputtering governed milling phenomenon, [27,35,36] in the present report, the overlapped region is found to undergo self-organization. Instead of getting sputtered as conventionally expected, the material forms a straight wall protruding out of the surface providing better control over the morphology of the nanoholes induced by a single FIB-spot, resulting in a designed polygonal nanostructure.…”

Section: Resultscontrasting

confidence: 94%

“…It has been known conventionally that during FIB milling the size and diameter of nanohole increase with an increase in the ion dose. [27,35,36] Initially, the neighboring nanoholes are smaller in size and far apart when the milling process begins. The diameter and overall size of the nanoholes increase with an increase in the dose; thus, the boundaries of adjoining holes start overlapping each other.…”

Section: Conceptmentioning

confidence: 99%

“…The further irradiation leads to the etching of the overlapped region due to ion beam assisted milling, and the wall between adjoining holes undergoes erosion. [35,36] The self-organization, if controlled properly, can be vital for transforming the circular nanoholes (which are routinely formed by each pixel during the milling process) into designed polygonal nanoholes. The self-organization is to be engineered in such a way that when the ion beam dose is increased, the boundary wall between the adjoining nanoholes undergoes a straightening process instead of getting eroded, as represented in Figure 1b.…”

Section: Conceptmentioning

confidence: 99%

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Tailoring Surface Self‐Organization for Nanoscale Polygonal Morphology on Germanium

et al. 2021

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radiation (THz radiation) emission. [12][13][14] Partially amorphized Ge quantum dots encapsulated in the silicon matrix are proven to show an improved lasing action making them potentially useful for application in silicon integrated technology. [1,2] Enhanced molecular sensing capabilities have been demonstrated by plasmonenhanced infrared absorption due to an array of germanium nanostructures. [3,4] Arrays of GeSi nanostructures on silicon substrate showed an enhancement in the photo-voltage, showing promise for solar cell applications. [10] Surprisingly, germanium being an indirect bandgap semiconductor, periodic arrays of germanium nanostructures gave rise to THz radiation emission with comparable amplitude to the direct bandgap semiconductor n-GaAs (n-type GaAs). [13] Germanium nanostructures show threefold to fivefold increased amplitude of THz radiation emission as compared to the baregermanium surface. Local surface charge collection due to the high surface area is attributed to the enhanced THz emission from the Ge nanostructures. [12] These reports suggest that the periodic arrays of nanostructures play an essential role for improved light-matter interactions such as enhanced surface plasmon based sensing and improved terahertz emission. [3,4,13] The evolution of polygonal-shaped nanoholes on the (100) surface of germanium, aided by focused ion beam induced self-organization, is presented. The energetic beam of ions creates a viscous phase which, at a thermodynamical minimum, leads to surface self-organization. A directed viscous-flow along the predefined nanoholes provides well-ordered polygonal nanostructures, ranging from triangles to hexagons and octagons, as desired. The amorphization exhibiting a confined viscous-flow at the walls of nanoholes is attributed to the localized melting zones induced by sitespecific thermal spikes during ion irradiation, as revealed by microscopy and molecular dynamics studies. This leads to a local self-organization in the vicinity of each circular nanohole via a viscous-fingering process at the nanoscale. Such controlled self-organization, with the help of a predefined scanning grid, transforms the circular holes into the desired polygonal shape. The present morphology manipulation promises to surmount the barriers concerning the size reduction efforts in the field of nanofabrication.

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Section: Resultscontrasting

confidence: 94%

Section: Conceptmentioning

confidence: 99%

Section: Conceptmentioning

confidence: 99%

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Tailoring Surface Self‐Organization for Nanoscale Polygonal Morphology on Germanium

et al. 2021

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“…It is also possible to exploit the Gaussian profile to fabricate interesting geometries. 82–84 Figure 14 shows the nanostructures fabricated directly via Gaussian profile of the ion beam. Here, we have used FIB with a negative overlap for the fabrication of nanoholes corresponding to each pixel scanned.…”

Section: Focused Ion Beam: Technology and Applicationsmentioning

confidence: 99%

Micromachining: An overview (Part I)

Jain

Balasubramaniam

Mote

et al. 2020

Journal of Micromanufacturing

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This article gives classification of micromanufacturing in general and micromachining processes in particular. For different micromachining processes, one can have different kinds of operations through which different features, shapes, accuracy, precision, and dimensions can be achieved. This article as Part I reports an overview of only three processes as diamond turn machining (a class of traditional micromachining processes), electrochemical micromachining, and focused-ion-beam micromachining (a class of advanced micromachining processes). About all these three processes, a brief introduction to the mechanisms of material removal is reported followed by the new developments in each process which are discussed independently. In various sections, some areas where research work needs to be done are identified and very briefly discussed.

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“…Among various nanoplasmonic fabrication techniques, such as nanosphere lithography [18], e-beam lithography [22], plasma synthesis [23], focused ion beam machining [24], chemical deposition [25] and solid-sate dewetting [26], the dewetting procedure offers cost effective and time efficient solutions for fabrication of the plasmonic nanostructures on a given substrate. However, it should be noted that these advantages of dewetting are also associated with the trade off with relatively less periodically distributed nanostructures.…”

Section: Introductionmentioning

confidence: 99%

Dewetting Metal Nanofilms—Effect of Substrate on Refractive Index Sensitivity of Nanoplasmonic Gold

et al. 2019

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The localized surface plasmon resonance (LSPR) sensitivity of metal nanostructures is strongly dependent on the interaction between the supporting substrate and the metal nanostructure, which may cause a change in the local refractive index of the metal nanostructure. Among various techniques used for the development of LSPR chip preparation, solid-state dewetting of nanofilms offers fast and cost effective methods to fabricate large areas of nanostructures on a given substrate. Most of the previous studies have focused on the effect of the size, shape, and inter-particle distance of the metal nanostructures on the LSPR sensitivity. In this work, we reveal that the silicon-based supporting substrate influences the LSPR associated refractive index sensitivity of gold (Au) nanostructures designed for sensing applications. Specifically, we develop Au nanostructures on four different silicon-based ceramic substrates (Si, SiO2, Si3N4, SiC) by thermal dewetting process and demonstrate that the dielectric properties of these ceramic substrates play a key role in the LSPR-based refractive index (RI) sensitivity of the Au nanostructures. Among these Si-supported Au plasmonic refractive index (RI) sensors, the Au nanostructures on the SiC substrates display the highest average RI sensitivity of 247.80 nm/RIU, for hemispherical Au nanostructures of similar shapes and sizes. Apart from the significance of this work towards RI sensing applications, our results can be advantageous for a wide range of applications where sensitive plasmonic substrates need to be incorporated in silicon based optoelectronic devices.

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Focused Ion Beam Direct Fabrication of Subwavelength Nanostructures on Silicon for Multicolor Generation

Cited by 23 publications

References 27 publications

Tailoring Surface Self‐Organization for Nanoscale Polygonal Morphology on Germanium

Tailoring Surface Self‐Organization for Nanoscale Polygonal Morphology on Germanium

Micromachining: An overview (Part I)

Dewetting Metal Nanofilms—Effect of Substrate on Refractive Index Sensitivity of Nanoplasmonic Gold

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