Focused Ion Beam Assisted Etching of Aluminum.

Itoh, Fumikazu; Azuma, Junzou; Haraichi, Satoshi; Shimase, Akira

doi:10.2493/jjspe.59.1531

Cited by 2 publications

(2 citation statements)

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“…Some of the ions will re-deposit to other pixels (indicated by yellow dots) while some of ions will scatter away the desired structure (indicated by blue dots). The re-deposited volume can be found from re-deposition model [5]. Thus, extra time is required to mill away the re-deposited volume on the pixels.…”

Section: Two-dimensional Re-deposition Modelmentioning

confidence: 99%

Uncertainty analysis to minimise risk in designing micro-electronics manufacturing processes

Tang

Stoyanov

Bailey

et al. 2008

2008 2nd Electronics Systemintegration Technology Conference

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A design methodology based on numerical modelling, Integrated with optimisation techniques and statistical methods, to aid the process control of micro and nanoelectronics based manufacturing processes is presented in this paper. The design methodology is demonstrated for a micro-machining process called Focused Ion Beam (FIB). This process has been modelled to help understand how a pre-defined geometry of micro-and nano-structures can be achieved using this technology. The process performance is characterised on the basis of developed Reduced Order Models (ROM) and are generated using results from a mathematical model of the Focused Ion Beam and Design of Experiment (DoE) methods. Two ion beam sources, Argon and Gallium ions, have been used to compare and quantify the process variable uncertainties that can be observed during the milling process. The evaluations of the process performance takes into account the uncertainties and variations of the process variables and are used to identify their impact on the reliability and quality of the fabricated structure. An optimisation based design task is to identify the optimal process conditions, by varying the process variables, so that certain quality objectives and requirements are achieved and imposed constraints are satisfied. The software tools used and developed to demonstrate the design methodology are also presented.

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Section: Two-dimensional Re-deposition Modelmentioning

confidence: 99%

Uncertainty analysis to minimise risk in designing micro-electronics manufacturing processes

Tang

Stoyanov

Bailey

et al. 2008

2008 2nd Electronics Systemintegration Technology Conference

View full text Add to dashboard Cite

show abstract

“…10 Due to the important biological function of LSD1 in various types of tumors and neurological diseases, the research of LSD1 inhibitors has increasingly drawn the attention of the cancer research field. Several effective LSD1 inhibitors have been produced, such as peptides, [11][12][13][14] polyamines, [15][16][17][18] phenylcyclopropylamine, 9,[19][20][21][22][23][24][25][26] and many others. [27][28][29][30] LSD1 is constitutive of SWIRM, TOWER, and amine oxidase like domain (AOL), which is shown in Fig.…”

Section: Introductionmentioning

confidence: 99%